vaporizer

A gasifier and gasification technology, applied in the field of gasifiers, can solve problems such as fluctuations in the supply concentration of gasification gas, and achieve the effects of preventing uneven temperature and uniform heat distribution

Active Publication Date: 2016-06-08
FUJIKIN INC +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] However, in the gasifier using the bubbling method, there is a problem that fluctuations in various parameters such as the bubbling flow rate, the liquid level, the bubble diameter of the bubbling, and the liquid temperature cause fluctuations in the supply concentration of the gasification gas

Method used

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Embodiment 1

[0049] Hereinafter, an Example and a comparative example are given, and this invention is demonstrated more concretely. However, the present invention is not limited by the following examples.

Embodiment

[0051] In the example, using the figure 1 The same system as the liquid material gasification supply system shown, housed in the gasifier Figure 2-4 A grid-like partition wall structure of the shape shown. The grid-like partition wall structure is formed of a stainless steel plate with a thickness of 0.5 mm, the grid interval (the length of one side of a grid division) is 3.6 mm, the height is 2.5 cm, and the height of the notched recesses constituting the liquid flow part is 1 mm. As the liquid material, TMGa (trimethylgallium) was used. The pressure of the pressure-feeding gas (nitrogen) was set at an absolute pressure of 200 kPa. The heating device was controlled so that the temperature in the vaporizer became 75°C. The pressure on the downstream side of the pressure-adjustable flow control device was set to 1.8 Torr, and the flow rate was controlled to 56 sccm by the pressure-adjustable flow control device. When the TGMa of the liquid in the vaporizer decreases and th...

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Abstract

The present invention provides a vaporizer capable of stabilizing pressure behavior in the vaporizer. The vaporizer of the present invention is provided with: a cavity having an inlet and an outflow port; a heating device that heats the cavity; and a partition structure (13) that is provided in the cavity and divides the liquid material in the cavity. to a plurality of regions; and a liquid circulation part (20) provided at the lower part of the partition wall structure (13) to allow liquid circulation between the regions divided by the partition wall structure (13), the partition structure having Lattice, honeycomb, mesh, or tubular partitions.

Description

technical field [0001] The present invention relates to gasifiers and, in particular, generally to gasifiers for gasifying liquid organometallic materials. Background technique [0002] Conventionally, metal organic chemical vapor deposition (MOCVD: Metal Organic Chemical Vapor Deposition) has been used in the film formation process of compound semiconductors, ITO films, and the like. Furthermore, in the organometallic vapor phase growth method, a so-called bubbling vaporizer using a carrier gas to bubble a liquid organometallic material into a gas is known (Patent Documents 1, 2, etc.). [0003] However, in a gasifier using the bubbling method, there is a problem that fluctuations in various parameters such as the bubbling flow rate, liquid level, bubble diameter of the bubbling, liquid temperature, etc. cause fluctuations in the supply concentration of the gasification gas. [0004] Therefore, a liquid material gasification supply system has been proposed, which heats and...

Claims

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Application Information

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IPC IPC(8): H01L21/205C23C16/448
CPCC23C16/4481C23C16/448H01L21/02365
Inventor 大见忠弘白井泰雪永濑正明山下哲日高敦志土肥亮介西野功二池田信一平尾圭志
Owner FUJIKIN INC
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