Device for removing oxidation fog on silicon polishing surface by impurity absorption source prepared on back of silicon wafer by sand blasting
A technology for polishing surfaces and silicon wafers, applied to used abrasive treatment devices, manufacturing tools, abrasive jetting machine tools, etc., can solve the problems of difficult control, expensive equipment, poor repeatability, etc., and achieve uniform spraying, uniform damage and controllable , the effect of uniform flow
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[0023] In order to further explain the technical means and effects of the present invention to achieve the intended purpose of the invention, the following will be combined with the accompanying drawings and preferred embodiments to eliminate the oxide mist on the silicon polishing surface for the gettering source produced by sandblasting on the back of the silicon wafer according to the present invention. The specific implementation, structure, features and effects of the device are described in detail below.
[0024] The aforementioned and other technical contents, features and effects of the present invention will be clearly presented in the following detailed description of preferred embodiments with reference to the drawings. Through the description of specific embodiments, it should be possible to obtain a deeper and more specific understanding of the technical means and effects of the present invention to achieve the intended purpose, but the attached drawings are only f...
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