Parameter control method and parameter control system

Abstract

Provided are a parameter control method and a parameter control system. The method comprises the steps of the relevance of parameters to be detected is built, and an initial threshold range is set for each parameter to be detected; the value of each parameter to be detected is acquired, and whether the values are within the corresponding initial threshold ranges or not is obtained in a comparing mode; when the values exceed the corresponding initial threshold ranges, the initial threshold ranges of the parameters to be detected or other to-be-detected parameters related to the parameters to be detected are adjusted according to the relevance of the parameters to be detected. The system comprises a setting module, an acquiring module, a comparing module and an optimization module, the setting module is used for building the relevance between the parameters to be detected and respectively sets the initial threshold ranges for the parameters to be detected. The acquiring module acquires the value of each parameter to be detected. The comparing module judges whether the values are within the corresponding initial threshold ranges or not. The optimization module adjusts the initial threshold ranges of the parameters to be detected or other to-be-detected parameters related to the parameters to be detected according to the relevance of the parameters to be detected. The parameter control precision can be improved, and finally production cost is lowered.

Description

technical field [0001] The invention relates to the technical field of integrated circuit manufacturing, in particular to a parameter control method and a parameter control system. Background technique [0002] In the production department of an enterprise, a large number of products are produced or processed every day. The performance and quality of the product are related to the lifeline of the enterprise. It is particularly important to monitor, detect and analyze the product quality technically. The integrated circuit manufacturing process in the prior art generally includes the following stages: wafer production process (FAB process), wafer factory test (wafer acceptance test, WAT) process, wafer yield test (circuit probing, CP) process, Chip packaging (assembly) process and chip final test (final test, FT) process, and thus the types of parameters involved include: wafer production line parameters (inline parameter), wafer factory test parameters (WAT parameter), wafer...

AI Technical Summary

Problems solved by technology

[0004] However, in the actual application of SPC technology, there are the following problems: due to limited time, limited data or limited personnel, the threshold range set for the monitoring parameters when analyzing the parameters is simply unreasonable, sometimes even wrong , these problems will lead to an increase in the overall cost of production

For example: when the threshold range is too wide, some data that may cause problems will not be monitored, and finally lead to quality problems in the qualified products, which will affect the use of the entire product; when the threshold range is too narrow, unnecessary False alarms and unnecessary processing work will eventually lead to the fact that there is no quality problem in the monitored unqualified products, and even lead to the scrapping of good wafers. round scrap) will bring greater economic loss

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