A chemical vapor deposition device

Abstract

The invention relates to chemical vapor deposition equipment which comprises a shell, a reaction system, and a heating element positioned between the shell and the reaction system, wherein the reaction system is arranged in the shell, and comprises a raw material supply device and a reaction room; the heating element is arranged on the inner wall of the shell on the outer sides of the raw material supply device and the reaction room. The chemical vapor deposition equipment is characterized in that the shell comprises a shell main body and a door; an inner cavity is formed by surrounding of the shell main body and the door, and is a cuboid; the door can be opened or close one surface of the inner cavity. The chemical vapor deposition equipment, provided by the invention, can prepare materials with huge size, and realizes the preparation of the materials with huge size under the premise of possibly decreasing the volume; the single-surface door opening design enables the daily mounting and disassembly of internal components to be directly operated simply on the ground level; the control and use of a reaction furnace can be realized by less manpower; the chemical vapor deposition equipment satisfies the industrial large-scale production of preparing the materials with huge size by the CVD (Chemical Vapor Deposition) technology, improves the productivity, and reduces the production cost.

Description

technical field [0001] The invention relates to a chemical vapor deposition equipment, in particular to a chemical vapor deposition equipment for preparing ultra-large size body materials. Background technique [0002] CVD technology can realize the manufacture of various advanced materials, such as metal materials, ceramic materials, semiconductor materials, infrared optical materials, etc.; and can prepare tubes, thin films, powders, bulk materials, etc. Among them, it has unique advantages in the preparation of infrared optical materials such as CVDZnS and CVDZnSe. It can not only achieve high density, good purity, and good optical properties of the prepared materials, but also realize large-scale material preparation that cannot be achieved by other processes. [0003] figure 1 shows the conventional CVDZ n The reaction furnace 100 used in the preparation of S, conventional CVDZ n The preparation process of S is: put the raw material Z in the circular crucible contain...

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Problems solved by technology

[0007] In view of this, the object of the present invention is to provide a chemical vapor deposition equipment capable of preparing super-large-sized bulk materials, so as to solve the technical problem that super-large-sized bulk materials cannot be prepared in the prior art

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