Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Circuit generated low temperature plasma

A low-temperature plasma and circuit generation technology, applied in the field of plasma generation circuit and plasma disinfection box, can solve the problems of poor uniformity of low-temperature plasma, difficulty in obtaining plasma, low electron density and energy, and achieve discharge Uniformity, high efficiency of power supply energy utilization, and small discharge current

Inactive Publication Date: 2014-04-23
HUAZHONG UNIV OF SCI & TECH
View PDF12 Cites 8 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Corona discharge is easy to realize at normal pressure, but its uniformity is poor, electron density and energy are low, active substances are relatively small, and it is not easy to obtain a large volume of plasma
The power density of the dielectric barrier discharge is moderate, and the low-temperature plasma generated by the discharge evenly fills the discharge gas gap, does not require vacuum equipment, and the discharge noise is small, but because the dielectric barrier discharge discharge in the air is composed of a large number of high-energy and dense discharge current filaments, Therefore, the low-temperature plasma produced by it has poor uniformity and poor stability

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Circuit generated low temperature plasma
  • Circuit generated low temperature plasma

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0019] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention. In addition, the technical features involved in the various embodiments of the present invention described below can be combined with each other as long as they do not constitute a conflict with each other.

[0020] Such as figure 1 As shown, the low-temperature plasma generation circuit provided by the present invention includes a rectifier circuit 1, a sinusoidal inverter circuit 2, a high-frequency step-up transformer 3 and a discharge circuit 4;

[0021] The rectifier circuit 1 is used to convert the AC voltage into a DC voltage; it includes a single-phase rectification full bridge 11, a first f...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
diameteraaaaaaaaaa
Login to View More

Abstract

The invention discloses a circuit generated low temperature plasma, which comprises a rectifying circuit, a sine inverter circuit, a high-frequency step-up transformer and a discharge circuit. The rectifying circuit is used for converting a AC voltage into a DC voltage. The sine inverter circuit is used for converting the DC voltage into a certain frequency sine AC voltage. The high-frequency step-up transformer is used for boosting the sine voltage. The discharge circuit is used for forming a dielectric barrier corona discharge to generate the low-temperature plasma. According to the invention, the appropriate corona discharge and the dielectric barrier are combined to form stable and uniform than the dielectric barrier discharge, the energy utilization efficiency is higher than the dielectric barrier corona discharge of the corona discharge, and the circuit can be used to obtain the low temperature plasma. A disinfection box made by the circuit of the invention solves the problem that the traditional sterilization mode has high energy consumption, low efficiency, residual after sterilization, damage to the operating personnel and instruments, and influence on the surrounding environment.

Description

technical field [0001] The invention belongs to the field of gas discharge and application, and more specifically relates to a low-temperature plasma generation circuit, which is especially suitable for a low-temperature plasma disinfection box. Background technique [0002] Disinfection and sterilization is an important part of the daily work of medical units. Statistics show that in order to prevent infection, medical staff need to perform dozens to hundreds of disinfections within a working day, with an average of about once every ten minutes. The traditional liquid sterilization method needs to be rinsed for several minutes, and frequently used Disinfectants will cause adverse skin irritation to medical staff; medical utensils are often disinfected by high temperature and high pressure or drug fumigation, which consumes a lot of energy and is cumbersome to operate. A safe, simple, fast and low-temperature disinfection method with no residual toxicity has become a need. ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): H05H1/24A61L2/14
Inventor 李黎刘伦张钦胡文林福昌
Owner HUAZHONG UNIV OF SCI & TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products