Secondary printing alignment method of silicon solar cell

Abstract

The invention discloses a secondary printing alignment method of a silicon solar cell. The method includes the following steps that a, a first screen printing plate with a first locating identification mark group is provided; b, the first screen printing plate is used for conducting primary printing through a first printing machine to obtain a silicon wafer with a first locating pattern group, and the first locating pattern group is matched with the first locating identification mark group; c, a second screen printing plate with a second locating identification mark group is provided, second locating marks of the second locating identification mark group correspond to first locating identification marks of the first locating identification mark group one by one; d, the second screen printing plate is used for conducting secondary printing on the silicon wafer printed for the first time in the step b) through a second printing machine, a silicon wafer with a second locating pattern group is obtained, the silicon wafer is also provided with the first locating pattern group, and the second locating pattern group is matched with the second locating identification mark group. By means of the method, precision and numerical valve location of locating patterns in secondary printing can be achieved, artificial randomness and numerical value judgment errors are removed, aligning precision is improved, overstriking ratio of silk-screen printing is reduced, and production yield is improved.

Description

technical field [0001] The invention relates to a secondary printing alignment method for crystalline silicon solar cells, and belongs to the field of screen printing in the preparation process of crystalline silicon solar cells. Background technique [0002] At present, the alignment and debugging of the secondary printing technology in the original screen printing mainly depends on the production operator to manually judge the offset and approximate value according to the actual printed sample after the basic positioning of the Mark point on the equipment, and then perform the offset adjustment. Manual setting, this debugging work is determined by the proficiency of personnel and human judgment, and has artificial randomness and numerical judgment error. SUMMARY OF THE INVENTION [0003] The technical problem to be solved by the present invention is to overcome the defects of the prior art and provide a secondary printing alignment method for crystalline silicon solar ce...

AI Technical Summary

Problems solved by technology

[0002] At present, the alignment and debugging of the secondary printing technology in the original screen printing is mainly to rely on the production operator to manually judge the offset and approximate value according to the actual printed sample after the basic positioning of the Mark point on the equipment, and then perform the offset adjustment. Manual setting, this debugging work is determined by the proficiency of personnel and human judgment, with artificial randomness and numerical judgment errors

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