Chromatism-free patterning carbon nanotube transparent conductive film and preparation method thereof

Abstract

The invention discloses a chromatism-free patterning carbon nanotube transparent conductive film and a preparation method of the chromatism-free patterning carbon nanotube transparent conductive film. The chromatism-free patterning carbon nanotube transparent conductive film comprises a transparent substrate, a patterning carbon nanotube film which is at least distributed in a visible area on the surface of the transparent substrate, and a patterning insulating material layer distributed on the surface of the transparent substrate, the insulating material layer and the carbon nanotube film are staggered and complemented at least in the visible area, and the light transmittance of the insulating material layer and the light transmittance of the carbon nanotube film are also fundamentally consistent. The preparation method includes the steps of forming the patterning insulating material layer on the surface of the transparent substrate, and forming the patterning carbon nanotube film at least in the visible area on the surface of the transparent substrate. Preferably, the insulating material layer can be mainly made of hydrophobic insulating material, and paint can be further mixed. According to the chromatism-free patterning carbon nanotube transparent conductive film and the preparation method of the chromatism-free patterning carbon nanotube transparent conductive film, high-efficiency, large-area and continual preparation of the chromatism-free patterning carbon nanotube transparent conductive film can be achieved, the technology is easy and controllable, needed equipment is simple, cost is low, optical and electric properties of products are good, and the chromatism-free patterning carbon nanotube transparent conductive film has wide application prospects.

Description

technical field [0001] The invention relates to a preparation process of a patterned transparent conductive film, in particular to a patterned carbon nanotube transparent conductive film without color difference and a preparation method thereof. Background technique [0002] Transparent conductive film (TCF) is a kind of film that can conduct electricity and has high light transmittance in the visible light range. It is an important optoelectronic material, mainly used in touch screens, flat panel displays, thermal mirrors, and solar cell electrodes. and other fields. There are many types of transparent conductive films, among which the most mature application is indium tin oxide (ITO) film, but because indium in ITO is a rare metal, its price is high, the supply is limited, the ITO layer is fragile and lacks flexibility, and the preparation process is limited. Many problems such as the high cost in the future have greatly restricted its development, which has triggered the...

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Problems solved by technology

Although this approach can combine the coating and etching processes in the traditional touch screen process into one, greatly reducing production costs and improving production efficiency, but there are defects such as limited size and low yield, which limit its use in industrial production; The second is to prepare the entire carbon nanotube transparent conductive film first, and then form a carbon nanotube transparent conductive electrode by patterning

This patterning method is mainly to etch patterns on the surface of the carbon nanotube film by laser or plasma etching. This patterning method is relatively flexible and can etch different circuit patterns according to actual needs, but the low production efficiency hinders its development. main factor

[0004] In addition, because the resistance of carbon nanotube films is generally relatively high, under the premise of ensuring normal use, the light transmittance of the film is often very low (usually above 80%), which will form a certain shadow on the transparent substrate. Although the prior art provides a method of adding an anti-reflection film on the surface of the conductive material to produce a certain shadow removal effect, this method cannot be used on the conductive layer

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