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System for magnetorheological finishing of substrates

一种磁流变抛光、磁流变流体的技术，应用在磨蚀性抛光和磨光的系统领域

Active Publication Date: 2013-08-28
QED TECH INT
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

For example, this limits the choice of fluid components and limits the fluid composition for the greater solids concentration required for the increase in the removal rate.

Method used

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  • System for magnetorheological finishing of substrates
  • System for magnetorheological finishing of substrates
  • System for magnetorheological finishing of substrates

Examples

Experimental program
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Embodiment Construction

[0034] Reference attached figure 1 , Shows an improved system 10 for magnetorheological polishing of substrates. The system 10 includes a basic polishing device 12 consistent with the prior art, and a new IFMM 14 that exemplifies the present invention.

[0035] The prior art polishing device 12 may include, for example, a platform 16, a base 18, a motor 20, a wheel drive unit 22, a wheel shaft 24, a bearing wheel 26 mounted on the shaft 24, and an electromagnet 28. The substrate or workpiece 30 is mounted above the surface of the wheel 26, preferably at the top-center dead center position, and the substrate or workpiece 30 is separated from the wheel 26, thereby forming a convergent processing zone 32, as the wheel 26 is moved by the motor 20 Rotating in the clockwise direction 36, the low-viscosity MR ribbon 34 a is continuously loaded into the processing area 32 by the wheel 26. In the processing area 32, the magnetic field generated by the electromagnet 28 magneto-rheological...

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PUM

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Abstract

A system for magnetorheological finishing of a substrate. An integrated fluid management module (IFMM) provides dynamic control of the rheological fluid properties of the MR fluid on a conventional MR finishing apparatus, and dispensing of the fluid to the wheel. A magnetically shielded chamber charged with MR fluid is in contact with the carrier wheel. A transverse line removes the spent MR fluid from the wheel as the ribbon leaves the work zone. Replenishment fluid is added to the chamber via a dripper, and preferably an electric mixer agitates MR fluid in the chamber. A grooved magnetically-shielded insert at the exit of the chamber forms a polishing ribbon on the carrier wheel as the wheel is turned. A sensor sensitive to concentration of magnetic particles provides a signal for control of MR fluid properties, particularly, water content in the MR fluid.; Means is provided for cooling fluid within the chamber.

Description

Technical field [0001] The present invention relates to a system for magnetically assisted abrasive polishing and polishing of a substrate; more particularly to a system using magnetorheological (MR) polishing fluid; and most particularly, to an improved and low-cost system , Where the polishing operation does not require an MR fluid delivery system, and the polishing operation is performed by a magnetic hardening polishing belt formed by a new integrated management module (IFMM) that is equipped with MR polishing fluid and has a sensor, and An MR fluid regulating device that provides appropriate dynamic control of MR fluid performance. Background technique [0002] The use of magnetically hardened magnetorheological fluids to abrasively polish and polish substrates is well known. The fluid containing soft magnetic abrasive particles dispersed in a liquid carrier exhibits a magnetically induced thixotropic behavior in the presence of a magnetic field. The apparent viscosity of ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B24B1/00
CPCB24B1/005B24B31/112B24B37/00B24B37/34
Inventor W.考登斯基S.格劳德金A.赛克里斯
Owner QED TECH INT
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