Double-side light entering quantum dot sensitization solar cell and preparation method thereof
A technology for quantum dot sensitization and solar cells, which is applied in the field of quantum dot sensitization solar cells and its preparation, to achieve the effects of promoting industrialization, benefiting battery performance, and low reaction temperature
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Embodiment 1
[0034] 1) Wash. In the test, the FTO conductive glass substrate should be cleaned and dried first. First, cut the conductive glass to the required size with a glass knife, clean it with a detergent, and then rinse it with deionized water. Then place it in an ultrasonic cleaner and use acetone-free, ethanol, and ionized water to ultrasonically clean it for 10 minutes, and finally dry it with nitrogen to obtain the substrate with a clean surface required for the experiment.
[0035] 2) Preparation of quantum dot-sensitized photoanode. Scrape-coat a layer of pre-prepared TiO on clean FTO 2 slurry, sintered at 450 °C for 30 min to form TiO 2 Porous layer, repeated scraping until TiO 2 After reaching about 12 μm, the sintered photoanode is sequentially deposited three layers of CdS, five layers of CdSe, and two layers of ZnS quantum dots through a chemical bath, and finally washed thoroughly with deionized water, and then dried in an oven at 50 ° C. use.
[0036] 3) Prepare t...
Embodiment 2
[0041] 1) Wash. In the test, the FTO conductive glass substrate should be cleaned and dried first. First, cut the conductive glass to the required size with a glass knife, clean it with a detergent, and then rinse it with deionized water. Then place it in an ultrasonic cleaner and use acetone-free, ethanol, and ionized water to ultrasonically clean it for 10 minutes, and finally dry it with nitrogen to obtain the substrate with a clean surface required for the experiment.
[0042] 2) Preparation of quantum dot-sensitized photoanode. Scrape-coat a layer of pre-prepared TiO on clean FTO 2 slurry, sintered at 450 °C for 30 min to form TiO 2 Porous layer, repeated scraping until TiO 2 After reaching about 12 μm, the sintered photoanode is sequentially deposited three layers of CdS, five layers of CdSe, and two layers of ZnS quantum dots through a chemical bath, and finally washed thoroughly with deionized water, and then dried in an oven at 50 ° C. use.
[0043] 3) Prepare t...
Embodiment 3
[0048] 1) Wash. In the test, the FTO conductive glass substrate should be cleaned and dried first. First, cut the conductive glass to the required size with a glass knife, clean it with a detergent, and then rinse it with deionized water. Then place it in an ultrasonic cleaner and use acetone-free, ethanol, and ionized water to ultrasonically clean it for 10 minutes, and finally dry it with nitrogen to obtain the substrate with a clean surface required for the experiment.
[0049] 2) Preparation of quantum dot-sensitized photoanode. Scrape-coat a layer of pre-prepared TiO on clean FTO 2 slurry, sintered at 450 °C for 30 min to form TiO 2 Porous layer, repeated scraping until TiO 2 After reaching about 12 μm, the sintered photoanode is sequentially deposited three layers of CdS, five layers of CdSe, and two layers of ZnS quantum dots through a chemical bath, and finally washed thoroughly with deionized water, and then dried in an oven at 50 ° C. use.
[0050] 3) Prepare t...
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