Michelson Fluorescence Interferometric Micrometer Measuring Device Based on Stimulated Emission

An interference microscope and measuring device technology, which is applied to measuring devices, optical devices, instruments, etc., can solve the problems that the detection light is difficult to return, and the detection system cannot achieve high NA and high slope surface detection, so as to overcome the phase blur problem. Effect

Inactive Publication Date: 2015-07-29
HARBIN INST OF TECH
View PDF4 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0010] In order to solve the problem that it is difficult for the detection light to return to the detection system so that the detection of high NA and high slope surfaces cannot be realized, the present invention discloses a Michelson fluorescence interference microscopic measurement device based on stimulated radiation

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Michelson Fluorescence Interferometric Micrometer Measuring Device Based on Stimulated Emission

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0018] The specific embodiments of the present invention will be further described in detail below in conjunction with the accompanying drawings.

[0019] The structural schematic diagram of the Michelson fluorescence interference microscopic measurement device based on stimulated radiation in this embodiment is as follows figure 1 shown. The measuring device includes a laser 1, a converging objective lens 2 arranged on the direct optical path of the laser 1 along the light propagation direction, a first pinhole 3, a collimating beam expanding objective lens 4 and a beam splitting prism 5; An objective lens 6, a displacement driver 7, a reference mirror 8, a dichroic prism 9, and a test piece 10; an imaging converging objective lens 11, a narrowband filter 12, a second pinhole 13, and a detector 14 arranged on the transmission light path of the dichroic prism 5; The surface of the tested part 10 and the reference mirror 8 is coated by vacuum evaporation coating method.

[00...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention belongs to the technical field of surface topography measurement and relates to a stimulated radiation based Michelson fluorescence interference microscopic measurement device. The measurement device comprises a laser device, a converging objective lens, a first pinhole, a collimation and beam expanding objective lens, a first beam splitting prism, a focusing objective lens, a displacement driver, a reference mirror, a second beam splitting prism, a measured piece, an imaging converging objective lens, a narrow-band filter, a second pinhole and a detector, wherein the converging objective lens, the first pinhole, the collimation and beam expanding objective lens and the first beam splitting prism are disposed on a direct light path of the laser device along a light transmitting direction, the focusing objective lens, the displacement driver, the reference mirror, the second beam splitting prism and the measured piece are disposed on a reflected light path of the first beam splitting prism, and the imaging converging objective lens, the narrow-band filter, the second pinhole and the detector are disposed on a transmission light path of the first beam splitting prism. Surfaces of the measured piece and the reference mirror are coated by the aid of a vacuum evaporation coating method. By the design that surface properties of the measured piece are changed through coating, measurement light is guaranteed to be capable of returning to a detection system after being reflected by a measured surface, high-NA(numerical aperture) and high-slope surface detection is achieved, and the measurement device is applicable to ultra-precise measurement of three-dimensional topographies of high-NA and high-slope spherical surfaces, aspheric surfaces and free-form surfaces.

Description

technical field [0001] The Michelson fluorescence interference microscopic measurement device based on stimulated radiation belongs to the field of surface topography measurement technology, and particularly relates to a three-dimensional microstructure, microstep, and microgroove used in microstructured optical elements, microstructured mechanical elements, and integrated circuit elements. Ultra-precise, dynamic, high-speed interferometry method and device for groove line width and large numerical aperture optical element surface shape measurement. Background technique [0002] Microscopic interferometry is to use the principle of light wave interference and microscopic magnification for surface measurement. With the rapid development of optoelectronic technology and computer technology, the phase shift technology that directly measures the interferometric phase distribution has been developed in the field of interferometry. The principle is: introduce a time modulation t...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Patents(China)
IPC IPC(8): G01B11/24
Inventor 刘俭谭久彬王伟波张拓
Owner HARBIN INST OF TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products