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A liquid crystal display device

A technology of liquid crystal display devices and thin film transistors, which is applied in the direction of optics, optomechanical equipment, instruments, etc., can solve problems such as the stability of liquid crystal display devices, and achieve the effect of avoiding light-induced leakage current and weakening light-generated leakage current

Active Publication Date: 2015-08-12
TRULY SEMICON
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, it is still impossible to effectively avoid the generation of the photo-generated leakage current of the liquid crystal display device, and the stability of the operation of the liquid crystal display device is still affected by the photo-generated leakage current.

Method used

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  • A liquid crystal display device
  • A liquid crystal display device
  • A liquid crystal display device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0042] This embodiment discloses a liquid crystal display device, such as figure 1 shown, including:

[0043] The array substrate and the color filter substrate arranged oppositely, and the opaque spacer 10 between the array substrate and the color filter substrate.

[0044] Wherein, the array substrate includes:

[0045] The first transparent substrate 11 is preferably a glass substrate.

[0046] The gate lines 12 are located on the surface of the transparent substrate 11 . Wherein, the gate line 12 is specifically divided into a gate scan line and a gate.

[0047] The first protective layer 13 covers the gate lines 12 and the surface of the first transparent substrate 11 , and the first protective layer 13 is transparent.

[0048] A silicon island 14 , the silicon island 14 is made of amorphous silicon, is located on the surface of the first protection layer 13 , and the silicon island 14 is located directly above the gate of the gate line 12 . It can be seen that the l...

Embodiment 2

[0061] This embodiment discloses a method for manufacturing a liquid crystal display device, the method comprising:

[0062] Step S11, such as figure 2 As shown, an array substrate 101 is provided, and the array substrate 101 includes a first transparent substrate, gate lines, a first protection layer, silicon islands, data lines, a second protection layer and pixel electrodes.

[0063] Step S12 , forming a spacer above the thin film transistor of the array substrate, the spacer being an opaque spacer.

[0064] Specifically, the process of forming a spacer includes:

[0065] Such as image 3 As shown, an opaque photosensitive material is coated on the surface of the array substrate 101 to form an opaque layer 102. The opaque photosensitive material preferably includes 12% to 25% of photosensitive acrylic resin and 10% to 25% of photosensitive acrylic monomer. 25%, photosensitizer 2%~10%, stabilizer 0.3%~2%, propylene glycol monomethyl ether ester 50%~70% and carbon black 3...

Embodiment 3

[0072] This embodiment discloses another method for manufacturing a liquid crystal display device, the method comprising:

[0073] Step S21 , providing a color filter substrate, which includes a second transparent substrate, a black matrix, an ink layer, and a common electrode.

[0074] Step S22 , forming spacers on the surface of the color filter substrate, the spacers being opaque spacers.

[0075] Specifically, the process of forming a spacer includes:

[0076] An opaque photosensitive material is coated on the surface of the color filter substrate to form an opaque layer. The opaque photosensitive material preferably includes 12% to 25% of photosensitive acrylic resin, 10% to 25% of photosensitive acrylic monomer, and photosensitive 2%~10% agent, 0.3%~2% stabilizer, 50%~70% propylene glycol monomethyl ether ester and 3%~8% carbon black.

[0077] The opaque layer is exposed to light by using the mask with the sub-pattern of the gap as a mask, and the sub-pattern of the ga...

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Abstract

The invention discloses a liquid crystal display device. The liquid crystal display device comprises array substrates, color film substrates and opaque photo spacers, wherein the color film substrates are arranged relative to the array substrates, the opaque photo spacers are arranged between the array substrates and the color film substrates, and the photo spacers are arranged on the upper sides of thin film transistors of the array substrates. Due to the fact that the photo spacers are opaque and are arranged on the surfaces of the thin film transistors of the array substrates, the photo spacers are capable of blocking light reflected by the color film substrates. From structures of the thin film transistors, gate lines exist on the lower sides of silicon islands of the thin film transistors, and the same with the prior art, direct light of the backlight is blocked by the gate lines. By means of the thin film transistors, the photoproduction current leakage of the liquid crystal display device can be prevented effectively, and further the working stability of liquid crystal display device is prevented from being affected by the photoproduction current leakage.

Description

technical field [0001] The invention belongs to the field of liquid crystal display, in particular to a liquid crystal display device. Background technique [0002] The information society increasingly needs thin and portable display devices, and the most mature product at present is the Liquid Crystal Display (LCD). A liquid crystal display device generally includes a liquid crystal display panel for displaying pictures and a circuit part for supplying signals to the liquid crystal display panel. The liquid crystal display panel usually includes a color filter substrate and an array substrate, which are bonded to each other by frame glue and separated by gaps, and liquid crystal material is injected into the gap between the color filter substrate and the array substrate. [0003] The first substrate is, for example, a thin film transistor (Thin Film Transistor, TFT) array substrate, on which a plurality of gate lines and a plurality of data lines are formed, and a pluralit...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02F1/1335G02F1/1339G02F1/1333G03F7/00
Inventor 任思雨洪胜宝陈建荣阮文中林建伟柳发霖胡君文于春崎何基强
Owner TRULY SEMICON
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