Preparation method of silica-based surface carboxylated graphene oxide self-assembled composite film
A composite film and carboxylation technology, applied in chemical instruments and methods, carbon compounds, inorganic chemistry, etc., can solve the problems of not considering carboxyl group content, affecting graphene performance, weak interfacial bonding force of amino groups, etc. The effect of interface bonding force, low cost and convenient surface treatment
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Embodiment 1
[0028] This embodiment relates to a method for preparing a silicon-based surface carboxylated graphene oxide self-assembled composite film, comprising the following steps,
[0029] The raw materials used in this example include: graphene oxide: produced by Nanjing Pioneer Nano Material Technology Co., Ltd.; 3-aminopropyl-triethoxysilane (APTES): Shanghai Jingchun Reagent Co., Ltd.; polished single crystal Silicon wafer: purchased from Zhejiang Lijing Silicon Materials Co., Ltd. Other reagents were of analytical grade, and deionized water was prepared by the laboratory itself.
[0030] Step 1: Wash the polished single crystal silicon wafer with absolute ethanol and deionized water in sequence, blow dry with high-purity nitrogen, add 100 mL of 70 mL of concentrated H 2 SO 4 solution and 30mLH 2 o 2 Soak in the Piranha solution prepared from the solution for 30 minutes.
[0031] Step 2, take out the silicon chip in the Piranha solution, wash it with deionized water, dry it w...
Embodiment 2
[0040] This embodiment relates to a method for preparing a silicon-based surface carboxylated graphene oxide self-assembled composite film, comprising the following steps,
[0041] The raw materials used in this example include: graphene oxide: produced by Nanjing Pioneer Nano Material Technology Co., Ltd.; 3-aminopropyl-triethoxysilane (APTES): Shanghai Jingchun Reagent Co., Ltd.; polished polysilicon Sheet: purchased from Zhejiang Lijing Silicon Materials Co., Ltd. Other reagents were of analytical grade, and deionized water was prepared by the laboratory itself.
[0042] Step 1: Wash the polished polysilicon wafer with absolute ethanol and deionized water in sequence, blow dry with high-purity nitrogen, add 40 mL of 30 mL of concentrated H 2 SO 4 solution and 10mLH 2 o 2 Soak in the Piranha solution prepared by the solution for 60min.
[0043]Step 2, take out the silicon chip in the Piranha solution, wash it with deionized water, dry it with high-purity nitrogen, add 0...
Embodiment 3
[0051] This embodiment relates to a method for preparing a silicon-based surface carboxylated graphene oxide self-assembled composite film, comprising the following steps,
[0052] The raw materials used in this example include: graphene oxide: produced by Nanjing Pioneer Nano Material Technology Co., Ltd.; 3-aminopropyl-triethoxysilane (APTES): Shanghai Jingchun Reagent Co., Ltd.; polished polysilicon Sheet: purchased from Zhejiang Lijing Silicon Materials Co., Ltd. Other reagents were of analytical grade, and deionized water was prepared by the laboratory itself.
[0053] Step 1: Wash the polished polysilicon wafer with absolute ethanol and deionized water successively, blow dry with high-purity nitrogen, add 70 mL of 50 mL of concentrated H 2 SO 4 solution and 20mLH 2 o 2 Soak in the Piranha solution prepared by the solution for 50min.
[0054] Step 2, take out the silicon chip in the Piranha solution, wash it with deionized water, dry it with high-purity nitrogen, add...
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Abstract
Description
Claims
Application Information
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