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Preparation method of silica-based surface carboxylated graphene oxide self-assembled composite film

A composite film and carboxylation technology, applied in chemical instruments and methods, carbon compounds, inorganic chemistry, etc., can solve the problems of not considering carboxyl group content, affecting graphene performance, weak interfacial bonding force of amino groups, etc. The effect of interface bonding force, low cost and convenient surface treatment

Inactive Publication Date: 2013-04-24
SHANGHAI JIAO TONG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, in this method, the carboxyl functional group of graphene oxide is used for adsorption reaction, and the content of carboxyl on the surface of graphene is not considered.
Studies have shown that the carboxyl functional group only exists at the edge of the graphene sheet, and the content of the oxygen-containing functional group is relatively small, which will lead to a weak bond between the graphene and the amino interface on the surface of the substrate, which affects the performance of graphene during the friction process. to play
So far, no report has been found that graphene oxide is first carboxylated and then prepared into a self-assembled film to improve the friction and wear properties of silicon-based surfaces.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0028] This embodiment relates to a method for preparing a silicon-based surface carboxylated graphene oxide self-assembled composite film, comprising the following steps,

[0029] The raw materials used in this example include: graphene oxide: produced by Nanjing Pioneer Nano Material Technology Co., Ltd.; 3-aminopropyl-triethoxysilane (APTES): Shanghai Jingchun Reagent Co., Ltd.; polished single crystal Silicon wafer: purchased from Zhejiang Lijing Silicon Materials Co., Ltd. Other reagents were of analytical grade, and deionized water was prepared by the laboratory itself.

[0030] Step 1: Wash the polished single crystal silicon wafer with absolute ethanol and deionized water in sequence, blow dry with high-purity nitrogen, add 100 mL of 70 mL of concentrated H 2 SO 4 solution and 30mLH 2 o 2 Soak in the Piranha solution prepared from the solution for 30 minutes.

[0031] Step 2, take out the silicon chip in the Piranha solution, wash it with deionized water, dry it w...

Embodiment 2

[0040] This embodiment relates to a method for preparing a silicon-based surface carboxylated graphene oxide self-assembled composite film, comprising the following steps,

[0041] The raw materials used in this example include: graphene oxide: produced by Nanjing Pioneer Nano Material Technology Co., Ltd.; 3-aminopropyl-triethoxysilane (APTES): Shanghai Jingchun Reagent Co., Ltd.; polished polysilicon Sheet: purchased from Zhejiang Lijing Silicon Materials Co., Ltd. Other reagents were of analytical grade, and deionized water was prepared by the laboratory itself.

[0042] Step 1: Wash the polished polysilicon wafer with absolute ethanol and deionized water in sequence, blow dry with high-purity nitrogen, add 40 mL of 30 mL of concentrated H 2 SO 4 solution and 10mLH 2 o 2 Soak in the Piranha solution prepared by the solution for 60min.

[0043]Step 2, take out the silicon chip in the Piranha solution, wash it with deionized water, dry it with high-purity nitrogen, add 0...

Embodiment 3

[0051] This embodiment relates to a method for preparing a silicon-based surface carboxylated graphene oxide self-assembled composite film, comprising the following steps,

[0052] The raw materials used in this example include: graphene oxide: produced by Nanjing Pioneer Nano Material Technology Co., Ltd.; 3-aminopropyl-triethoxysilane (APTES): Shanghai Jingchun Reagent Co., Ltd.; polished polysilicon Sheet: purchased from Zhejiang Lijing Silicon Materials Co., Ltd. Other reagents were of analytical grade, and deionized water was prepared by the laboratory itself.

[0053] Step 1: Wash the polished polysilicon wafer with absolute ethanol and deionized water successively, blow dry with high-purity nitrogen, add 70 mL of 50 mL of concentrated H 2 SO 4 solution and 20mLH 2 o 2 Soak in the Piranha solution prepared by the solution for 50min.

[0054] Step 2, take out the silicon chip in the Piranha solution, wash it with deionized water, dry it with high-purity nitrogen, add...

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PUM

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Abstract

The invention provides a preparation method of a silica-based surface carboxylated graphene oxide self-assembled composite film. The method comprises the following steps: 1, after a silicon wafer subjected to processing is cleaned and dried, putting the silicon wafer into a Piranha solution to soak; 2, taking out the silicon wafer in the Piranha solution, cleaning and drying the silicon wafer, adding the silicon wafer into a silane solution to carry out self-assembling reaction, thereby obtaining a product A; 3, taking out the product A, cleaning and drying the product A, thereby obtaining a silicon wafer with a silica-based surface on which an aminosilane film is arranged; 4, putting the product obtained in the step 3 into a graphene oxide solution subjected to carboxylation so as to carry out reaction, thereby obtaining a product B; and 5, taking out the product B, carrying out cleaning, drying and carrying out heat preservation on the product B so as to obtain a final product silica-based surface carboxylated graphene oxide self-assembled composite film. The friction coefficient of a product prepared by using the method disclosed by the invention is 0.18-0.22, and the wear life is greater than 2400 seconds; and the preparation method disclosed by the invention is simple in process and low in cost, and provides convenience for the surface treatment of silica-based parts in micro electro mechanical systems.

Description

technical field [0001] The invention relates to a method for preparing a carboxylated graphene oxide composite film, in particular to a method for preparing a silicon-based surface carboxylated graphene oxide self-assembled composite film. Background technique [0002] The micromechanical system (MEMS) system is a cutting-edge technology that combines microelectronics technology and micromachining technology. system. Since the size of the gap between the components of the MEMS system is nanoscale or even zero gap, there will be a size effect during the relative movement, and problems such as friction and adhesion between the components seriously affect the stability and product life of MEMS. The commonly used materials for components in MEMS are brittle materials such as single crystal silicon, polycrystalline silicon, and nitride, so the main reason for their failure is that the adhesion between the contact surfaces is easy to occur. Correspondingly, the research on the f...

Claims

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Application Information

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IPC IPC(8): C04B41/50C01B32/198
Inventor 程先华疏达李鹏飞王传英程海正华晨
Owner SHANGHAI JIAO TONG UNIV
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