Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Mild moisturizing soap-based cleaning cream

A facial cleanser and moisturizing technology, applied in the field of daily chemicals, can solve the problems of high temperature stratification, high alkalinity, dry skin, etc., and achieve the effect of reducing the dosage

Active Publication Date: 2012-10-17
OPAL COSMETICS HUIZHOU
View PDF3 Cites 9 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The technical problem to be solved by the present invention is to provide a mild and moisturizing soap-based facial cleanser formula, which solves the problems of current soap-based facial cleansers such as "high temperature stratification", "high alkalinity" and "dry skin". Its PH value is weakly alkaline, which can provide deep cleansing, moisturizing and moisturizing effects to the skin

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Mild moisturizing soap-based cleaning cream

Examples

Experimental program
Comparison scheme
Effect test

preparation example Construction

[0032] The preparation method of the present invention is a conventional configuration and mixing technique, which will not be described in detail here.

[0033] The present invention uses in the mode of conventional skin cleaning, mainly comprises the following steps:

[0034] (1) Wet face and hands with clean water first;

[0035] (2) Use an appropriate amount of the product of the present invention in the palm of your hand, gently knead the foam, apply it to the face, and gently knead the facial skin for one minute.

[0036] (3) Rinse off the foam on the skin with water.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a mild moisturizing soap-based cleaning cream, falling into field of daily chemicals. The cream comprises the following materials by weight: 20-25% of fatty acid, 4.5-5% of caustic soda, 40-60% of glycerol, 1-2% of non-ionic surfactant, 1-1.5% of ethylene glycol distearate, 0.3-0.6% of fatty alcohol, and the balance of water. The cleaning cream provides deep cleaning and moisturizing effect for facial skin, has semi-transparent pearlite appearance, and has no skin irritation.

Description

technical field [0001] The invention belongs to the field of daily chemicals, and in particular relates to a mild and moisturizing soap-based facial cleanser. Background technique [0002] Facial cleanser has gradually been accepted by consumers as a facial cleanser. It is a facial cleansing product for the purpose of cleaning the skin. It has both the good cleaning power of soap and certain care functions. According to different production processes, facial cleanser can be divided into surfactant type and soap-based facial cleanser. [0003] Soap-based facial cleanser has rich foam and strong cleaning ability. However, many soap-based facial cleansers on the market currently face several major problems; the system is unstable, that is, it is easy to separate at high temperature; The skin is dry and tight afterwards. Contents of the invention [0004] The technical problem to be solved by the present invention is to provide a mild and moisturizing soap-based facial clean...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): A61K8/65A61K8/44A61K8/42A61K8/37A61K8/36A61Q19/10
Inventor 叶莲
Owner OPAL COSMETICS HUIZHOU
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com