Color filter substrate and manufacturing method for same

Abstract

The invention discloses a color filter substrate and a manufacturing method for the same. The method comprises the following steps of: forming a black matrix pattern in a pixel ineffective area of a transparent substrate to form a mark; coating a transparent conductive layer on the pixel inactive area to cover the mark; and patterning the transparent conductive layer to make the covering characteristics of the transparent conductive layer at the mark and the peripheral zone of the mark different. Optical differences of the mark and the peripheral zone of the mark under a charge coupled device (CCD) optical pickup lens are effectively enhanced, and the success rate of the pickup of the mark is increased, so that production efficiency is improved.

Description

technical field [0001] The invention relates to the technical field of liquid crystal display, in particular to a color filter substrate and a manufacturing method thereof. Background technique [0002] In the liquid crystal panel manufacturing process, the alignment mark (mark) plays an important role. When position confirmation and coordinate calculation are required, the position of the alignment mark needs to be read. For example, when performing coordinate positioning of precision measuring instruments and exposure alignment of exposure machines, it is necessary to read the position of the alignment marks; Confirm the group position of the substrate. [0003] see figure 1 , figure 1 It is a schematic diagram of setting the alignment mark on the existing color filter substrate. [0004] Such as figure 1 As shown, in the prior art, the transparent substrate 10 of the color filter substrate includes a plurality of effective pixel regions 100 and invalid pixel regions ...

AI Technical Summary

Problems solved by technology

[0006] When using a CCD (Charge-coupled Device, charge-coupled device) optical reading lens to read the position of the alignment mark 1010, since the coverage characteristics of the transparent conductive layer 120 on the alignment mark 1010 and the surrounding area of ​​the alignment mark 1010 are the same , has no optical difference, so the success rate of the CCD optical reading lens in reading the alignment mark 1010 is not high, and even the reading fails, which causes the deviation of the position calculation accuracy of the process or reduces the utilization rate of the equipment , leading to low production efficiency and capacity

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