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HCl dehydration and purification method suitable for synthesis of trichlorosilane

A technology of trichlorosilane and purification method, which is applied in the direction of silicon halide compound and halosilane, etc., which can solve the problems of high dehydration cost of molecular sieve, increase of production cost, increase of silicon powder unit consumption, etc., and achieve inhibition of by-product tetrachloride Effects of silicon formation, yield improvement, and avoidance of equipment corrosion

Inactive Publication Date: 2013-05-08
SICHUAN RENESOLA SILICON MATERIAL
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  • Abstract
  • Description
  • Claims
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Problems solved by technology

[0004] (1) Corrosion equipment and pipelines;
[0005] (2) It is easy to cause pipeline blockage and cause system paralysis;
[0007] (4) Increase the unit consumption of silicon powder, thereby increasing the production cost
The cost of molecular sieve dehydration is very high, and the regeneration cycle is long, so there are certain limitations in the application of HCl dehydration in the polysilicon industry

Method used

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  • HCl dehydration and purification method suitable for synthesis of trichlorosilane

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Embodiment 1

[0038] Such as figure 1 As shown, the device includes silicon tetrachloride vaporizer 1, silicon dioxide separator a 2 and silicon dioxide separator b 3, HCl heating jacket 4, HCl / SiCl 4 Mixed gas heating sleeve 5 and gas phase silicon tetrachloride heating sleeve 6 .

[0039] A kind of HCl dehydration purification technology applicable to the synthesis of trichlorosilane, comprising the following steps:

[0040] 1) Vaporize silicon tetrachloride in silicon tetrachloride vaporizer 1 with steam above 0.9Mpa, and vaporize to above 150°C.

[0041] 2) For HCl whose temperature is lower than 140°C, first heat the HCl to above 140°C through a heating sleeve 4, and the heating sleeve uses the steam condensate after heat exchange of the silicon tetrachloride vaporizer to heat, making full use of energy .

[0042] 3) A certain amount of gaseous silicon tetrachloride and HCl heated to above 140°C through the heating sleeve 4 enter the silica separator a 2 and two The silica separato...

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Abstract

The invention discloses a method for dehydrating and purifying HCl suitable for the synthesis of trichlorosilane, comprising steps: 1) vaporizing silicon tetrachloride; 2) putting vaporized silicon tetrachloride and HCl in a silica separator 3) The mixed gas of silicon tetrachloride and HCl is heated and enters into the trichlorosilane synthesis furnace; 4) Part of the gaseous silicon tetrachloride enters directly into the trichlorosilane synthesis furnace from the silicon tetrachloride vaporizer In the chlorohydrogen silicon synthesis furnace, the present invention utilizes polysilicon production waste silicon tetrachloride to dehydrate HCl. This method is suitable for the existing trichlorosilane production system below 0.5MPa, which not only solves the problem of vaporization and In order to solve the problem of pipeline effusion, the two concepts of silicon tetrachloride dehydration and introduction of silicon tetrachloride into the trichlorosilane synthesis furnace to increase the production of trichlorosilane are skillfully combined; the production of by-product silicon tetrachloride is suppressed Generation, and then indirectly promoted the occurrence of the main reaction, improved the output of trichlorosilane.

Description

Technical field [0001] The present invention involves a method of dehydration and purification of HCL gas for polysilicon silicon production and increased silicon hydrochloride production. Specifically, the method of removing water in HCL with gas tetrachloride is used and can increase the production of silicon silicon. Background technique [0002] In recent years, with the rapid development of global new energy replacement and my country's solar photovoltaic industry, the demand for polysilicon market has experienced explosive growth, resulting in a situation of tight polysilicon lack.At present, the main raw material for the production of polysilicon to produce polysilicon is silicon, also known as coilsine. [0003] At present, the domestic method is mainly used to synthesize the silicon hydrochloride. The raw materials are industrial silicon powder and HCL gases.If the water content in the raw materials exceeds the standard, it will cause great harm to the entire trichloride...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C01B33/107
Inventor 雷嵩沈伟
Owner SICHUAN RENESOLA SILICON MATERIAL
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