Method for manufacturing electronic device and separation apparatus used therefor
A technology of electronic devices and manufacturing methods, applied in semiconductor/solid-state device manufacturing, electrical solid-state device, printed circuit manufacturing, etc.
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Embodiment 1
[0438] Examples of the present invention will be described.
[0439] First of all, for the vertical 720mm, horizontal 600mm, plate thickness 0.4mm, linear expansion coefficient 38×10 -7 A support glass substrate (manufactured by Asahi Glass Co., Ltd., AN100, non-alkali glass substrate) at / °C was cleaned by washing with pure water and UV.
[0440] Next, on the supporting glass substrate, the size of 705 mm in length and 595 mm in width is applied by a screen printing machine (coating amount: 30 g / m 2 ) Silicone for solvent-free addition reaction type release paper (Shin-Etsu Silicone Co., Ltd., KNS-320A, viscosity: 0.40 Pa·s, 100 parts by mass, platinum-based catalyst (Shin-Etsu Silicone Co., Ltd., CAT-PL-56) 2 parts by mass of the mixture.
[0441] Next, this was heated and cured at 180° C. in the air for 30 minutes to obtain a silicone resin layer with a thickness of 20 μm on the surface of the supporting glass substrate.
[0442] Secondly, for the vertical 715mm, horizon...
Embodiment 2
[0474] In Example 2, except having changed the board|substrate into the polyethylene terephthalate resin board|substrate of thickness 0.1mm, it carried out similarly to Example 1, produced the laminated body B, and performed the same test as peeling test 3. As a result, the support body and the polyethylene terephthalate resin substrate can be peeled off without damaging the laminated body B. The charged voltage of the polyethylene terephthalate resin substrate after peeling was +0.3 kV.
Embodiment 3
[0476] In Example 3, the laminate C was produced in the same manner as in Example 1 except that the substrate was changed to a mirror-finished stainless steel (SUS304) substrate with a thickness of 0.1 mm, and the same test as in the peeling test 3 was performed. As a result, the support body and the stainless steel substrate can be peeled off without damaging the laminate C. The charged voltage of the stainless steel substrate after peeling was +0.02 kV.
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