Lithography apparatus using extreme uv radiation and having a volatile organic compounds absorbing member comprising a getter material

A technology of organic compounds and lithography equipment, applied in micro-lithography exposure equipment, optomechanical equipment, optics, etc.

Active Publication Date: 2013-07-10
SAES GETTERS SPA
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0013]It is thus an object of the present invention to provide a lithographic apparatus using extreme UV rays which is able to solve or at least minimize the occurrence of inorganic volatile molecular problem

Method used

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  • Lithography apparatus using extreme uv radiation and having a volatile organic compounds absorbing member comprising a getter material
  • Lithography apparatus using extreme uv radiation and having a volatile organic compounds absorbing member comprising a getter material
  • Lithography apparatus using extreme uv radiation and having a volatile organic compounds absorbing member comprising a getter material

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Embodiment Construction

[0022] Also in the following reference will be made to supports made of semiconducting material, but this is only a preferred embodiment for carrying out the invention, there will be cases where a device requires a support of a different type of material, for example an insulating or non-conductive material.

[0023] figure 1 EUVL devices are shown schematically and in a very simplified manner. The apparatus 10 comprises a first chamber 11 in which there is an EUV radiation source 110 and a collector 111 which collects a part of the radiation emitted from the source in all directions and directs the radiation to the next chamber; a second chamber 12 , comprising a monochromator 120 that selects a desired wavelength from the frequency band emitted from the source and directs monochromatic rays to the next cavity; and a processing cavity 13 that contains a holding mask 131 (the mask with design onto a polymeric film, which is arranged on a support made of semiconducting materi...

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Abstract

A lithography apparatus (10) is disclosed using extreme UV radiation and having a hydrocarbon sorbing member comprising a getter material arranged in the process chamber (13) of said apparatus.

Description

technical field [0001] The present invention relates to a lithographic apparatus using extreme UV rays and having a volatile organic compound (VOCs) absorbing member including a getter material. Background technique [0002] Photolithography is a technique used in the manufacture of integrated circuits to define the geometry of the components forming these circuits; this technique is also used in other similar manufacturing processes, such as those of micromechanical systems (known in the field of MEMs). For the purpose of illustrating the invention, in the text reference will be made to the manufacture of integrated circuits (known as ICs), but the invention can be used in all manufacturing processes utilizing photolithographic techniques. [0003] In the fabrication of ICs, a film of polymeric material is positioned onto or formed on a thin sheet of support material (typically silicon or other semiconductor material) from a liquid precursor, the film of polymeric material ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20
CPCG03F7/70916G03F7/20H01L21/0274
Inventor P·玛尼尼A·孔特
Owner SAES GETTERS SPA
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