Optimized layout method of multiple chemical risk sources
A layout method and technology of risk sources, applied in the fields of instruments, computing, electrical and digital data processing, etc., can solve problems such as threats to the life and health of people, explosions of toxic chemicals, and the possibility of terrorist attacks on civilian chemical facilities, and achieve the economic cost of layout. Small, avoid serious threat effects
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[0029] Attached below figure 1 And embodiment the present invention is described further.
[0030] 1. Randomly generate the initial value of the layout position of each chemical risk source (x i ,y i ), i=1, 2, ..., N, N is the number of chemical risk sources;
[0031] 2. Statistics on the local meteorological observation data throughout the year obtained typical meteorological conditions that are not conducive to atmospheric diffusion, including small wind, temperature inversion, and weather conditions that occur at the same time (when the wind is small or the temperature is inversion, the poisonous gas does not easily diluted, which may cause greater casualties).
[0032] Due to the different toxicity of different chemicals, in order to uniformly calculate, before carrying out the poisonous gas diffusion model, the source intensity Q i Adjusted, that is, multiplied by a factor k i , so that the adjusted source strength Q i '=k i Q i , k i The bigger it is, the more ...
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