Plasma-enhanced chemical vapor deposition PECVD equipment

Abstract

The present invention discloses a plasma-enhanced chemical vapor deposition PECVD equipment comprising a PECVD chamber, a heat exchanger and a heat exchange pipeline, wherein the PECVD chamber comprises a supporting plate and a base plate; the heat exchanger is used for heating the fluid in the heat exchange pipeline; one end of the heat exchange pipeline is connected with the heat exchanger and the other end thereof is divided into two branch pipelines which respectively lead to the supporting plate and the base plate of the PECVD chamber and are used for heating the supporting plate and the base plate so as to stably reach the temperature state for normally generating a deposition reaction; and in the production process of 'a first battery plate', the equipment can avoid the problem that the first battery plate effect is generated as the equipment temperature does not reach the temperature state for normally generating the deposition reaction and improve the quality of the product and the yield rate of good products.

Description

technical field [0001] The invention relates to a plasma-enhanced chemical vapor deposition PECVD process, in particular to a PECVD device. Background technique [0002] In the production process of silicon-based thin-film solar cells, the coating process needs to be completed in the plasma enhanced chemical vapor deposition (Plasma Enhanced Chemical Vapor Deposition, PECVD) equipment. The existing practice finds that if the PECVD equipment stops running for a long time, it will be resumed. The color difference between the first cell produced after visual inspection and the normal product is different, and the photoelectric conversion efficiency is also lower than the normal product by more than 15% after testing, which is also called the first cell effect in the industry. [0003] Analyzing the reason, when depositing the first cell, some parts of the PECVD equipment did not fully reach the stable temperature, and the temperature change diagram is as follows figure 1 As sh...

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Problems solved by technology

[0006] The embodiment of the present invention provides a plasma-enhanced chemical vapor deposition equipment and method, so that when the PECVD equipment produces the first cell after a long period of stoppage, the deposition chamber of the PECVD equipment is in the same state as during normal deposition, so as to solve the "second The problem of "one-cell effect"

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