Process control method and device thereof

Abstract

The invention provides a process control method which comprises the following steps: step a, receiving a target output variable; step b: computing a target procedure variable by a preset process prediction model and a feedback control model, wherein, the process prediction model is used for describing a functional relation between the procedure variable and the output variable, a target function of the feedback control model is used for solving the target procedure variable which has the minimum distance from a preset reference value, and a constraint condition of the feedback control model is that the target output variable and the target procedure variable correspond with the process prediction model; step c, inputting the target procedure variable to actual process equipment to obtain an actual output variable; and step d, judging the deviation between the target output variable and the actual output variable, adjusting the preset process prediction model and repeating the step b if the deviation does not meet a preset requirement, or ending the step if the deviation meets the preset requirement. The process control method has relatively obvious effect on reducing the computational complexity and improving the control precision.

Description

A process control method and device technical field The invention relates to the technical field of industrial process control, in particular to a process control method and device. Background technique Process feedback control, that is, control using feedback information. The actual working performance of the production system is measured by the sensing system or measuring system, and then compared with the required standard. If there is a difference, it will be explained by the control system, and the control system will give commands to the operating device in order to correct the work performance. Eliminate variance. This is the simplest feedback-based model. For example, in the semiconductor etching process, the feedback control technology of the process is a very critical technology. In recent years, with the continuous update of process etching technology, people have higher and higher requirements for etching equipment and silicon wafer quality control during t...

AI Technical Summary

Problems solved by technology

The exponential weighted moving average method is only suitable for single-input-single-output control systems. When performing multi-input single-output and multi-input multi-output system control, the calculation process is very complicated. If a small link in the control model is not handled properly, it may leading to high errors;

For nonlinear programming control methods, the difficulty lies in the complexity and uncertainty of the calculation process (not all nonlinear programming problems can be solved);

Model predictive control method, because the control process involved is too complicated, the feasibility of its application in actual process production is not very great

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