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Liquid immersion microscope

A microscope and liquid immersion technology, applied in microscopes, optics, instruments, etc., can solve the problem of not being able to observe the substrate by liquid immersion

Inactive Publication Date: 2008-10-22
NIKON CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In this way, in the above-mentioned apparatus, liquid immersion observation of the substrate cannot be performed non-destructively (that is, non-destructive inspection)
The same problem is not limited to the case of observing the substrate under partial liquid immersion, but also occurs when observing the entire surface under liquid immersion.

Method used

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Embodiment Construction

[0014] Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.

[0015] In the liquid immersion microscope device 10 of this embodiment, as figure 1 As shown, there are stage parts (11-13) for supporting the substrate 10A to be observed, a liquid immersion objective lens 14, a mechanism (15, 16) for supplying liquid for observation, and a liquid for cleaning. Mechanisms (17-19) for supplying, mechanisms (20-22) for removing these liquids, and a control unit 23 for controlling each unit.

[0016] In addition, in the liquid immersion microscope device 10 , although not shown, an automatic transport illumination optical system or an observation optical system, a mechanism for the substrate 10A, a TTL autofocus mechanism, and the like are also provided.

[0017] The substrate 10A is a semiconductor wafer, a liquid crystal substrate, or the like. The liquid immersion microscope device 10 is a device for performing liquid immer...

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Abstract

It is possible to provide a liquid immersion microscope capable of performing liquid immersion observation of a substrate in a nondestructive way without deteriorating the substrate quality. For this, the liquid immersion microscope includes: support means (11-13) for supporting a substrate (10A) as an observation object; an objective lens (14) of the liquid immersion system; first supply means (15, 16) for supplying ultra pure water as an observation liquid between the tip end of the objective lens and the substrate; first removal means (20-22) for removing the observation liquid after observation of the substrate; second supply means (17-19) for supplying a cleaning liquid different from the observation liquid removed by the first removal means (20-22) to an area of the substrate which has been in contact with the observation liquid; and second removal means (20-22) for removing the cleaning liquid after cleaning the substrate.

Description

technical field [0001] The present invention relates to a liquid immersion microscope device for liquid immersion observation of a substrate. Background technique [0002] In order to observe defects or foreign objects in circuit patterns formed on substrates (such as semiconductor wafers or liquid crystal substrates, etc.) with high resolution, it is proposed to use a liquid immersion objective lens and fill the space between the front end of the objective lens and the substrate with liquid such as water. . A technique of increasing the aperture number of the objective lens according to the refractive index (>1) of the liquid (for example, refer to Patent Document 1). In addition, a technique of drying the substrate with an organic solvent, an air knife, or the like after liquid immersion observation of the substrate, and returning the dried substrate to a cassette has also been proposed. [0003] Patent Document 1: Japanese Patent Laid-Open No. 2005-83800 [0004] How...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B21/00
CPCG02B21/33G02B21/00
Inventor 柴田浩匡小松学内川敏男
Owner NIKON CORP
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