6-freedom micro-motion platform capable of isolating exterior vibration

Abstract

The invention discloses a six-degree of freedom micropositioner capable of isolating external vibration. The micropositioner comprises a motor sheet support, a level drive module, a wafer supporting stage, an air foot, a leveling focusing module and a plurality of gravity compensators; wherein the level drive module is arranged on the motor sheet support; moreover, the level drive module is connected with the wafer supporting stage to drive the wafer supporting stage to move in horizontal direction; the air foot is arranged at the bottom of the entire micropositioner to support the motor sheet support and the gravity compensators; the gravity compensators is used to support the leveling focusing module; the wafer supporting stage floats on the leveling focusing module by means of an airfloated structure; the horizontal and vertical uncoupling of the micropositioner is realized by the leveling focusing module and the airfloated structure of the wafer supporting stage. With high controllability, the micropositioner can realize high-speed and high-precision locating and can isolate vibration.

Description

technical field [0001] The invention relates to a workpiece table, in particular to a micro-motion table with six degrees of freedom and high precision used in semiconductor equipment or liquid crystal display manufacturing equipment. Background technique [0002] High-precision workpiece tables with six degrees of freedom are commonly used in semiconductor manufacturing equipment or liquid crystal display manufacturing equipment, such as lithography equipment, high-precision processing equipment and precision measurement equipment in the semiconductor industry. In lithography equipment, the workpiece table is composed of a coarse motion table and a micro motion table. The function of the micro motion table is to carry the silicon wafer and precisely position the silicon wafer. This precise positioning includes vertical and horizontal directions. The combination of fine motion table and coarse motion table can move in a large stroke. As the size and output of silicon wafers...

AI Technical Summary

Problems solved by technology

The above-mentioned patent documents basically rely on magnetic levitation to eliminate vibration. The disadvantage of this method is that the control is complicated, the stability is poor, and there will be magnetic field interference.

Another technical solution to eliminate vibration is through air flotation isolation. Air flotation isolation is to isolate the entire workpiece table, so that the load quality is large and the control stability is poor.

In addition, the driving force of the horizontal motor does not coincide with the center of mass of the wafer table, which will interfere with the acceleration and deceleration of the entire wafer table. At present, the solution to the horizontal and vertical coupling is solved by reeds, and the effect is not as good as that of air Floating shock isolation is good

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