Slit nozzle

A slit nozzle and slit technology, applied in the field of slit nozzles, can solve problems such as difficult control of discharge pressure, increased volume, insufficient pressurization, etc., to achieve the effect of eliminating uneven film thickness and reducing idle time

Active Publication Date: 2008-06-18
艾美柯技术株式会社
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  • Abstract
  • Description
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Problems solved by technology

[0011] In addition, the volume occupied by the air is relatively increased for the amount of the coating liquid. Therefore, due to the buffer effect caused by the air, the pressurization of the coating liquid by the coating liquid supply pump is not sufficient, and it is also conceivable that it is difficult to realize the adjustment of the discharge pressure. control
[0012] In addition, in the method using the suction pump disclosed in Patent Document 2, it is difficult to separate and suck out the air bubbles mixed with the coating liquid.

Method used

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Embodiment Construction

[0024] Hereinafter, preferred embodiments of the present invention will be described based on the drawings. Fig. 1 is the perspective view of the slit nozzle related to the present invention, Fig. 2 is the figure that shows the nozzle half body that constitutes the slit nozzle related to the present invention, Fig. 3 (a) is the sectional view along A-A direction among Fig. 1, ( b) is a cross-sectional view along the B-B direction in FIG. 1 .

[0025] The slit nozzle is formed by butting the left and right nozzle halves 1 and 2 and integrating them with bolts. On the surface of one nozzle half 1 opposite to the nozzle half 2, a coating liquid flow path 3 is formed. The coating liquid channel 3 is formed as a coating liquid channel formed by the first storage part 4 and the second storage part 5 .

[0026] The shed top 4a of the first storage part 4 is pierced to a depth approximately half the size of the nozzle half body 1 in the thickness direction (the left-right direction i...

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Abstract

The invention relates to a slit nozzle which can reduce leisure time in a task for discharging bubble and eliminate a paint film with an asymmetrical film thickness caused by the bubble. The bubble (air) taken into a coating liquid separates from the coating liquid and concentrates in the ceiling part of a first reservation part(4) in the process of flowing from the first reservation part(4) to the second reservation part(5). Because the first reservation part (4) shapes like two seriate hills, the air reaches the top along the ceiling and be discharged from an air exhaust port (7) positioned on the top.

Description

technical field [0001] The present invention relates to a slit nozzle for coating a coating liquid on a substrate surface with a constant width. Background technique [0002] As a method of applying a coating liquid such as a photoresist to the surface of a glass substrate or the like, a spin coating method in which the coating liquid is dropped from a nozzle onto the substrate surface and then rotated at a high speed to form a uniform thickness is generally used. However, using this method causes more than 90% of the applied coating liquid to scatter, resulting in waste. Therefore, recently, after applying the coating liquid to the substrate with a certain width using a slit nozzle, the method of making the thickness of the coating film uniform by rotating to a certain extent, or adopting the method of spraying the coating liquid with a certain width with a slit nozzle A method in which the coating is applied to the substrate and the coating process is completed without sp...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B05C11/00B05C11/02B05C11/10
CPCB05C5/0225H01L21/027
Inventor 高瀬真治山口和伸熊泽博嗣
Owner 艾美柯技术株式会社
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