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Base plate cleaning device

A cleaning device and substrate technology, applied in the cleaning/polishing of conductive patterns, secondary treatment of printed circuits, electrical components, etc., can solve the problems of long time consumption in cleaning steps, unfavorable increase of display capacity, and unfavorable display capacity.

Inactive Publication Date: 2010-10-13
IND TECH RES INST
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] However, if the time for the brush to contact the substrate is increased, the time consumed by the cleaning step will be too long, which is not conducive to the improvement of the production capacity of the display; probability, which will increase the probability of substrate slippage and lamination, which is not conducive to the improvement of the production capacity of the display

Method used

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Embodiment Construction

[0036] Figure 1A is a side view of a substrate cleaning apparatus according to the first embodiment of the present invention, and Figure 1B Yes Figure 1A top view of the brush wheel. Please refer to Figure 1A and Figure 1B , a substrate cleaning device 101 according to the first embodiment of the present invention is used to clean a substrate 10 moving along a moving direction M, wherein the substrate 10 can pass through a plurality of guide rollers 20 of a substrate conveying device or other The mechanism moves horizontally along the moving direction M.

[0037] In the first embodiment, the substrate cleaning apparatus 101 does not include the above-mentioned substrate conveying apparatus, but in other embodiments, the substrate cleaning apparatus 101 and the substrate conveying apparatus may also be integrated into a single device.

[0038] The substrate cleaning device 101 includes a brush wheel 110, which is pivotally disposed above the conveying path of the substra...

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Abstract

The invention discloses a substrate cleaning device which is suitable for cleaning a substrate moving along a movement direction. The substrate cleaning device includes a brush wheel which rotates around a rotating shaft and is used for brushing surface of the substrate; the angle formed by the rotating shaft and the direction of movement is larger than 0 DEG and less than 90 DEG. The substrate cleaning device can increase cleaning efficiency of the substrate and reduce generation chance of sliding of the substrate.

Description

technical field [0001] The invention relates to a cleaning device, in particular to a device for cleaning the surface of a substrate by using a brush wheel. Background technique [0002] Due to the rapid development of flat-panel display technology, its application has gradually extended from computer screens to home TVs. As far as the thin film transistor liquid crystal display (TFT-LCD) manufacturing process is concerned, the cleaning step is often connected to the timing before, during and after the steps of coating, photolithography and etching to maintain the surface cleanliness of the display substrate during the production process. . [0003] The cleaning methods of the substrate surface include chemical and physical cleaning methods. For example, using the cilia on the surface of the rotating brush wheel to scrub the surface of the substrate to achieve the purpose of cleaning belongs to a physical cleaning method. Brush cleaning is generally applied to the cleanin...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H05K3/26H05K3/00
Inventor 蔡东璋
Owner IND TECH RES INST
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