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System for balancing and positioning work table of photoetching device

A technology of positioning system and workpiece table, which is applied in the direction of microlithography exposure equipment, photoplate making process exposure device, etc., can solve the problem that it is difficult to match the rotating motor, etc., and achieve the effect of reducing difficulty, reducing reaction force and improving positioning accuracy

Active Publication Date: 2007-11-21
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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  • Abstract
  • Description
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AI Technical Summary

Problems solved by technology

Furthermore, from the perspective of driving torque and structure, the system has only one momentum wheel, and it is difficult to match a suitable rotating motor

Method used

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  • System for balancing and positioning work table of photoetching device
  • System for balancing and positioning work table of photoetching device
  • System for balancing and positioning work table of photoetching device

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Embodiment Construction

[0031] The preferred embodiments of the present invention will be described below in conjunction with the accompanying drawings, so that the purpose, specific structural features and advantages of the present invention can be further understood.

[0032] Fig. 1 is a 2D view of the exposure unit of a lithography machine. It can be seen from the figure that the exposure unit of the lithography machine mainly includes a whole machine frame 102, an illumination system 101, a mask table system 103, an objective lens system 104, a focusing Leveling system 105, workpiece platform system 106, workpiece platform laser interferometer 107, etc. Wherein the workpiece table system 106 is exactly the workpiece table balance positioning system that we will explain in this invention.

[0033] Please refer to Figures 2 and 3, the workpiece platform balance positioning system mainly includes a basic frame 1, a long-stroke module, an exposure platform 10, a balance mass system, a balance mass an...

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Abstract

A balance-positioning system of work-piece table on photo-etching machine is prepared as setting long stroke module on balance mass unit to drive exposure table to move along X and Y directions, arranging balance mass unit on base frame to balance reverse-acting force and reverse-acting torque, setting balance mass drift-proof unit between base frame and master balance mass to compensate drift of balance mass unit along X and Y as well as Rz directions, using control system to control position compensation of long stroke module and master balance mass according to feedback data of measurement unit.

Description

technical field [0001] The invention belongs to the technical field of semiconductor lithography, and relates to a large-stroke precision positioning system with a balance mass, in particular to a balance positioning system applied to a workpiece table of a lithography machine. Background technique [0002] After the emergence of 300mm high-yield and low-linewidth lithography machine technology, especially the emergence of dual-stage technology and immersion technology, the workpiece table and mask table systems generally introduce balance block technology to solve the vibration reduction problem of the whole machine system . The so-called balance block technology is to fix the mover of the motor on the drive element, the stator is fixed on the balance block, and the drive element, balance block and frame are respectively connected by air bearings; under the interaction between the mover and the stator, The driving element and the balance weight move in opposite directions ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20
Inventor 王占祥袁志扬严天宏
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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