Solid state imaging device, manufacturing method of the same, and electronic equipment

Abstract

A solid state imaging device that includes a phase difference detection pixel which is a pixel for phase difference detection; a first imaging pixel which is a pixel for imaging and is adjacent to the phase difference detection pixel; and a second imaging pixel which is a pixel for imaging other than the first imaging pixel. An area of a color filter of the first imaging pixel is smaller than an area of a color filter of the second imaging pixel.

Description

TECHNICAL FIELD[0001]The present disclosure relates to a solid state imaging device, a manufacturing method of the same, and electronic equipment. In particular, the present disclosure relates to a solid state imaging device, a manufacturing method of the same, and electronic equipment which enable the suppression of color mixing and the suppression of sensitivity reduction in pixels for phase difference detection.CROSS REFERENCE TO RELATED APPLICATIONS[0002]This application claims the benefit of Japanese Priority Patent Application JP 2013-257294 filed Dec. 12, 2013, and Japanese Priority Patent Application JP 2014-109412 filed May 27, 2014, the entire contents of each of which are incorporated herein by reference.BACKGROUND ART[0003]In recent years, there has been wide adoption of imaging apparatuses such as digital still cameras and digital video cameras which image an object such as a person or an animal using a solid state imaging device, which is a Complementary Metal-Oxide Se...

AI Technical Summary

Benefits of technology

The patent text describes a method to detect phase differences and prevent color mixing and sensitivity reduction in pixels used for phase difference detection. Additionally, it aims to prevent color mixing in pixels that are adjacent to the phase difference detection pixels. The "technical effects" of this patent include improved accuracy and reliability in detecting phase differences and reduced impact on color quality.

Problems solved by technology

However, there is a case in which, when the arrangement interval between the color filters is narrow, color mixing and color shading (color unevenness) occur due to process variation caused by shifts that occur during the matching of the lithography process of the color filters.

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