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Multiple wafer single bath etcher

a multi-wallet, etcher technology, applied in the direction of sealing devices, electrolysis components, coatings, etc., can solve the problems of limited speed of etching and uniformity of etching

Inactive Publication Date: 2018-01-04
TRUTAG TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

The patent describes a process for producing porous silicon using a multiple wafer single bath etcher. This etcher allows for the simultaneous etching of multiple wafers, resulting in more consistent and uniform production. The etcher includes multiple blades that hold a single wafer each, which increases the speed of etching and reduces the impact of etching uniformity on the material produced. The etcher also includes a tunnel that allows for the circulation of etchant between the blades to keep the wafer surface exposed to uniform etchant. The technical effects of this patent include improved consistency and speed of production of porous silicon.

Problems solved by technology

However, uniformity of etching and speed of etching is limited when a single wafer is etched in a bath.

Method used

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  • Multiple wafer single bath etcher
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Examples

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Embodiment Construction

[0013]The invention can be implemented in numerous ways, including as a process; an apparatus; a system; a composition of matter; a computer program product embodied on a computer readable storage medium; and / or a processor, such as a processor configured to execute instructions stored on and / or provided by a memory coupled to the processor. In this specification, these implementations, or any other form that the invention may take, may be referred to as techniques. In general, the order of the steps of disclosed processes may be altered within the scope of the invention. Unless stated otherwise, a component such as a processor or a memory described as being configured to perform a task may be implemented as a general component that is temporarily configured to perform the task at a given time or a specific component that is manufactured to perform the task. As used herein, the term ‘processor’ refers to one or more devices, circuits, and / or processing cores configured to process da...

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Abstract

An etcher comprises a bath, a plurality of blades, and a tunnel. The bath includes a first electrode at a first end and a second electrode at a second end. The plurality of blades is configured to fit in the bath. At least one blade of the plurality of blades holds a wafer. At least one tunnel is configured to fit between adjacent blades of the plurality of blades in the bath.

Description

CROSS REFERENCE TO OTHER APPLICATIONS[0001]This application is a continuation of co-pending U.S. patent application Ser. No. 14 / 576,054, entitled MULTIPLE WAFER SINGLE BATH ETCHER filed December 18, 2014 which is incorporated herein by reference for all purposes.BACKGROUND OF THE INVENTION[0002]Porous silicon material has many applications including sensors, adsorbents, optical reflectance and refractance applications and battery anodes. It is because of both the material and optical properties of porous silicon, and the relative ease and low cost by which this material can be produced that it has such widespread applications.[0003]Porous silicon production uses etching of silicon wafers in a bath. However, uniformity of etching and speed of etching is limited when a single wafer is etched in a bath. Further, typically, the etch characteristics vary over the surface of the wafer impacting consistency of the materials produced.BRIEF DESCRIPTION OF THE DRAWINGS[0004]Various embodiment...

Claims

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Application Information

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Patent Type & Authority Applications(United States)
IPC IPC(8): H01L21/67C25F7/00C25F3/12C25D17/08C25D11/00C25D17/06C25D17/00C25D11/32H01L21/306C25D21/04
CPCC25D21/04C25D11/005C25D17/08C25F7/00C25F3/12C25D17/008C25D17/06C25D11/32H01L21/30604H01L21/67086C25D21/10C25D17/004
Inventor KIM, TAMLEIDHOLM, CRAIG
Owner TRUTAG TECH
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