Array testing method using electric bias stress for TFT array
a thin film transistor and array technology, applied in static indicating devices, fault locations by increasing destruction at faults, instruments, etc., can solve problems such as deterioration of tft-lcd image quality during operation, inability to move charges (off current), and unstable amorphous silicon. the effect of stable amorphous silicon
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[0031]In accordance with the present invention, to detect defects in a TFT panel, an electric bias is applied to the TFT panel for a known time period. The applied electric bias induces charge trapping in the SiNx film and / or state creation in the a-Si:H film, thus giving rise to the TFT threshold voltage shift. The shift in the threshold voltage results in the variation of the TFT IOFF current. The amount of the threshold voltage shift (ΔVT) depends on the applied bias voltage, the duration of the bias, as well as the initial density of state in the films.
[0032]FIG. 7A is an energy band diagram of an MIS device prior to the application of an electric bias. FIG. 7B is an energy band diagram of the MIS device of FIG. 7A after the application of an electric bias causing charges to be trapped in the band gap. FIG. 7C is an energy band diagram of the MIS device of FIG. 7A after the application of an electric bias causing states to be created in the band gap.
[0033]FIG. 8 shows the depend...
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