Measuring device and method for half-wave voltage and optical uniformity of electro-optical crystal material
A technology of optical uniformity and half-wave voltage, which is used in the measurement of dynamic extinction ratio and half-wave voltage, and the field of static extinction ratio. Compared with problems such as half-wave voltage, it achieves the effect of easy to operate measurement method, reliable measurement device and reliable results.
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[0020] The structure of the measuring device is as image 3 shown. It includes a helium-neon laser 6 , a polarizer 7 , a polarizer 8 , a photodiode 9 , a galvanometer 10 , and a high-voltage power supply 11 . According to the light path direction, a beam splitter 12 is set at an angle of 135° with the incident light angle after the polarizer 7. After the beam splitter, the crystal to be measured is placed, followed by a total reflection mirror 5 perpendicular to the optical path. In the beam splitter 12 Directly below is the polarizer 7, the photodiode 9 is electrically connected to the galvanometer 10, the silver electrodes on the upper and lower surfaces of the electro-optic crystal C are also electrically connected to the high-voltage power supply 11, and the other components are optically connected.
[0021] The measurement method is to place an optically active electro-optic crystal La 3 Ga 5 SiO 14 The crystal (LGS) is horizontally placed at the position of the measu...
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