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Piezoelectric type electrostatic chuck

An electrostatic chuck and piezoelectric technology, which is applied in the manufacture of circuits, electrical components, semiconductors/solid-state devices, etc., can solve the problems of difficult control of stability, unstable use of electrostatic chucks, and high cost, and achieve the effect of stable radio frequency circuits

Pending Publication Date: 2022-07-15
艾希纳半导体科技(苏州)有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The structure diagram of the existing electrostatic chuck is as follows: figure 1 As shown, its main components are: electrode 1, ceramic plate 2 and aluminum base 3, wherein ceramic plate 2 is fixed on aluminum base 3, electrode 1 is set on ceramic plate 2 and aluminum base 3, and aluminum base 3 is an electrical signal In the place of input, in actual use, the electrostatic chuck drives the plasma sheath in the modulation electrode 1 with electrical signals (radio frequency, direct current), and the radio frequency power source must be equipped with a corresponding automatic matching network, which has a complex structure and is expensive. And the stability is difficult to control; in addition, although the DC source control method needs a matching network, the structure is simple, but it is easy to cause the power of the RF loop to be unstable
To sum up, whether it is a radio frequency power source or a DC source to control the electrostatic chuck, it will cause the electrostatic chuck to be unstable, and the electrostatic chuck cannot continue to move objects stably.

Method used

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Examples

Experimental program
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Effect test

Embodiment 1

[0016] refer to figure 2 and 3 , is the first embodiment of the present invention, this embodiment provides a piezoelectric electrostatic chuck, including an electrode 1, a ceramic plate 2 and an aluminum substrate 3, the ceramic plate 2 is arranged on the aluminum substrate 3, and the ceramic plate 2 is Made of sintered aluminum nitride, the aluminum base 3 is where the radio frequency enters, the electrode 1 is set on the ceramic plate 2 and the aluminum base 3, the electrode 1 is made of tungsten or titanium alloy, and the ceramic plate 2 and the aluminum base 3 are between A piezoelectric module is jointly provided, and the piezoelectric module is based on the capacitive response in the radio frequency circuit of the mechanical energy driving the electrode 1 to affect the plasma. The piezoelectric module includes a central piezoelectric module 4, an excessive piezoelectric module 5, and surrounding The piezoelectric module 6 and the edge piezoelectric module 7, the centr...

Embodiment 2

[0018] refer to figure 2 and 3 , is the second embodiment of the present invention. This embodiment is based on the previous embodiment. Specifically, the central piezoelectric module 4, the excessive piezoelectric module 5, the surrounding piezoelectric modules 6 and the edge piezoelectric modules 7 are all for the ring. The annular central piezoelectric module 4 , the excessive piezoelectric module 5 , the surrounding piezoelectric modules 6 and the edge piezoelectric modules 7 are more regular in shape and conform to the shape of the electrostatic chuck.

[0019] The central piezoelectric module 4 , the excessive piezoelectric module 5 , the surrounding piezoelectric modules 6 and the edge piezoelectric modules 7 are all arranged concentrically. The central piezoelectric module 4 , the excessive piezoelectric module 5 , the peripheral piezoelectric modules 6 and the edge piezoelectric modules 7 arranged concentrically between the ceramic plate 2 and the aluminum substrat...

Embodiment 3

[0023] refer to figure 2 and 3 , which is the third embodiment of the present invention. This embodiment is based on the above two embodiments. When in use, the piezoelectric electrostatic chuck controls the central piezoelectric module 4 through separate hydraulic control systems. , excessive piezoelectric module 5, peripheral piezoelectric module 6, edge piezoelectric module 7, so that the central piezoelectric module 4, the excessive piezoelectric module 5, the peripheral piezoelectric module 6 or the edge piezoelectric module 7 Under the control of the corresponding hydraulic control system, the central piezoelectric module 4, the excessive piezoelectric module 5, the surrounding piezoelectric modules 6 or the edge piezoelectric modules 7 are mechanically The capacitive response in the radio frequency circuit in the drive electrode 1 can affect the plasma, thereby making the radio frequency circuit more stable, so as to achieve the effect of continuous stability when the...

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Abstract

The piezoelectric type electrostatic chuck comprises electrodes, a ceramic plate and an aluminum substrate, the ceramic plate is arranged on the aluminum substrate, the electrodes are arranged on the ceramic plate and the aluminum substrate, and a piezoelectric module is jointly arranged between the ceramic plate and the aluminum substrate. The piezoelectric module comprises a central piezoelectric module, a transition piezoelectric module, a peripheral piezoelectric module and an edge piezoelectric module, and the central piezoelectric module, the transition piezoelectric module, the peripheral piezoelectric module and the edge piezoelectric module are all arranged between the ceramic plate and the aluminum substrate. When the piezoelectric type electrostatic chuck is used, the central piezoelectric module, the transition piezoelectric modules, the peripheral piezoelectric modules or the edge piezoelectric modules drive capacitance response in a radio frequency circuit in an electrode to influence plasmas by mechanical energy in a liquid pressure changing mode, so that the radio frequency circuit is more stable, and the piezoelectric type electrostatic chuck is more stable in performance. Therefore, the effect that the piezoelectric type electrostatic chuck can be continuously stable when being used is achieved.

Description

technical field [0001] The invention relates to the technical field of suction cups, in particular to a piezoelectric electrostatic suction cup. Background technique [0002] Electrostatic chuck is a general term for ultra-clean sheet carrier, grabbing and handling equipment suitable for atmospheric or vacuum environments. The structure diagram of the existing electrostatic chuck is as follows figure 1 As shown, its main components are: electrode 1, ceramic plate 2 and aluminum substrate 3, wherein ceramic plate 2 is fixed on aluminum substrate 3, electrode 1 is arranged on ceramic plate 2 and aluminum substrate 3, and aluminum substrate 3 is the electrical signal In the place of input, in actual use, the electrostatic chuck drives the plasma sheath in the modulation electrode 1 with an electrical signal (RF, DC). The RF power source must be equipped with a corresponding automatic matching network, which is complicated in structure and expensive. And the stability is diffi...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/683
CPCH01L21/6831H01L21/6833
Inventor 张馨月陶文成朱莉
Owner 艾希纳半导体科技(苏州)有限公司
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