Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

POL panel auxiliary detection system

An auxiliary detection and panel technology, which is applied in the field of detection systems, can solve the problems that the polarizing stress meter cannot be used normally, easy-to-damage components, and damage to the detection window of the lifting detection shelf.

Pending Publication Date: 2022-06-28
ANHUI SALAER AUTOMATION TECH
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The purpose of the present invention is to provide a POL panel auxiliary detection system to solve the problem that in the process of adjusting the lifting type detection frame proposed in the above background technology, the lifting type detection frame will not be locked by the locking spring, so when there is a hand slip In other cases, the lift-type detection frame will fall down and hit the top of the detection host, which will not only easily damage the internal components of the detection host, but also damage the lift-type detection frame and the detection window , which will affect the detection accuracy of the entire polarizing strain gauge, or directly cause the problem that the polarizing strain gauge cannot be used normally

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • POL panel auxiliary detection system
  • POL panel auxiliary detection system
  • POL panel auxiliary detection system

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0022] The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, but not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present invention.

[0023] see Figure 1-4 , the present invention provides a technical solution: a POL panel auxiliary detection system, including a control chassis 1 and a detection host 3, the control chassis 1 is installed on the outer wall of the right end of the detection host 3, and a frame is arranged on the outer wall at the center of the left end of the uppermost side of the detection host 3. The plate falling protection device 4, the lofting t...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The POL panel auxiliary detection system comprises a control case and a detection host, the control case is installed on the outer wall of the right end of the detection host, and a frame plate falling protection device is arranged on the outer wall of the center of the left end of the uppermost side of the detection host. A novel frame plate falling protection device is additionally arranged on one side of the polarized light stress meter for the POL panel auxiliary detection system, and the novel frame plate falling protection device can play a role in buffering and supporting a lifting type detection frame plate when the lifting type detection frame plate loses locking force of a locking bolt and falls down; the buffer protection springs are stressed to be compressed and buffer and counteract impact force generated by downward falling of the lifting type detection frame plate, and after the buffer protection springs are compressed to a certain degree, falling of the lifting type detection frame plate can be stopped and stopped; therefore, the lifting type detection frame plate can be prevented from continuously falling down and directly colliding with the detection host, so that the lifting type detection frame plate and the detection host are prevented from being damaged.

Description

technical field [0001] The invention belongs to the technical field of detection systems, and in particular relates to a POL panel auxiliary detection system. Background technique [0002] The polarization stress meter can detect the birefringence of transparent and weakly colored materials, and accurately calculate the value of birefringence with an optical path error of less than 10nm by the Senarmont compensation method, and detect and analyze the distribution of birefringence through polarized light , the distribution and size of the refractive index directly reflect the distribution and size of the material stress, which is suitable for detecting products with complex structures such as lamps and high-density plastic products, such as contact lenses, and detecting optical crystals, such as calcium fluoride ( Fluorite), etc., among which the Senarmont compensation method can perform quantitative analysis and detection of stress, turn on the power, the entire field of vie...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G01N21/23G01L1/24
CPCG01N21/23G01L1/24
Inventor 刘洋
Owner ANHUI SALAER AUTOMATION TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products