Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Node topological graph layout method and device, computer storage medium and electronic equipment

A layout method and topology map technology, applied in special data processing applications, geometric CAD, etc., can solve problems such as inability to display nodes

Pending Publication Date: 2021-11-26
JD DIGITS HAIYI INFORMATION TECHNOLOGY CO LTD
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The purpose of the present disclosure is to provide a node topology map layout method, a node topology map layout device, a computer storage medium, and an electronic device, so as to overcome the problem that complete nodes cannot be displayed in a visual interface window in related technologies at least to a certain extent

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Node topological graph layout method and device, computer storage medium and electronic equipment
  • Node topological graph layout method and device, computer storage medium and electronic equipment
  • Node topological graph layout method and device, computer storage medium and electronic equipment

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0045] Example embodiments will now be described more fully with reference to the accompanying drawings. Example embodiments may, however, be embodied in many forms and should not be construed as limited to the examples set forth herein; rather, these embodiments are provided so that this disclosure will be thorough and complete and will fully convey the concept of example embodiments to those skilled in the art. The described features, structures, or characteristics may be combined in any suitable manner in one or more embodiments. In the following description, numerous specific details are provided in order to give a thorough understanding of embodiments of the present disclosure. However, those skilled in the art will appreciate that the technical solutions of the present disclosure may be practiced without one or more of the specific details being omitted, or other methods, components, devices, steps, etc. may be adopted. In other instances, well-known technical solution...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to the field of topological graph layout, and provides a node topological graph layout method and device, a computer storage medium and electronic equipment. The node topological graph layout method comprises the steps that according to a triggering position of a node creating operation acting on a reference node, the node creating operation is triggered; determining a position relationship between the to-be-arranged node and the reference node; the position relationship comprises a serial relationship or a parallel relationship; a preset association relationship exists between the triggering position and the position relationship; in response to the fact that the to-be-arranged node and the reference node meet the serial relation and the node display width is larger than the remaining display width of the current row in the visual interface, the to-be-arranged node or the reference node is arranged at the associated position of the reference node, wherein the associated positions are located in the same column and the next row of the reference node. The method provided by the invention can meet the requirement of a user for quickly viewing the general situation of each node from a global perspective.

Description

technical field [0001] The present disclosure relates to the field of topological map layout, in particular to a node topological map layout method, a node topological map layout device, a computer storage medium and electronic equipment. Background technique [0002] With the rapid promotion of the concept of CI / CD (CI / CD stands for Continuous Integration and Continuous Delivery), the visualization of pipelines in various systems has become a must in Web (World Wide Web, global wide area network) pages. With few requirements, how to arrange and draw nodes reasonably has become a key issue that developers have to consider. [0003] At present, nodes are generally laid out in the way of fixed expansion. Fixed expansion is to fix the size, position and direction of node arrangement of each node. Users can only expand nodes in the specified direction. Therefore, in the case of a large number of nodes, the graphics cannot be completely displayed in the visualization window, whi...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G06F30/18
CPCG06F30/18
Inventor 王维
Owner JD DIGITS HAIYI INFORMATION TECHNOLOGY CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com