Intelligent pressure balance control system

Abstract

The invention discloses an intelligent pressure balance control system which comprises a reaction furnace, a plurality of pressure detectors are fixedly connected to the inner wall of the reaction furnace, a gas inlet end and a gas outlet end are fixedly connected to the two sides of the reaction furnace respectively, and a pressurization assembly used for increasing the pressure in the reaction furnace is arranged on one side of the reaction furnace; the other side of reaction furnace is provided with pressure reduction assembly for reducing pressure in reaction furnace, and one side of reaction furnace is fixedly connected with control panel. The intelligent pressure balance control system is simple in structure and convenient to use, the air inlet end and the air outlet end can be opened by starting the driving motor and the first electric push rod, the pressure in the reaction furnace can be balanced conveniently, and gas in the reaction furnace can be uniformly distributed by starting a rotating motor and a second electric push rod, so that accurate pressure intensity can be conveniently detected by pressure intensity detectors at different positions in the reaction furnace, and the control panel can conveniently control a driving motor, a first electric push rod, a sucking pump and a getter pump to balance the pressure intensity in the reaction furnace.

Description

technical field [0001] The invention relates to the technical field of pressure balance control, in particular to an intelligent pressure balance control system. Background technique [0002] In semiconductor or solar diffusion furnace equipment, the traditional diffusion furnace production process adopts a non-closed tube method. Since this method has no constraints and control on the pressure in the furnace, it cannot achieve the corresponding pressure balance in the furnace. Therefore, traditional equipment is at the technological level. It is difficult to realize the pressure balance standard in the furnace in the diffusion process. With the rapid development of the semiconductor industry, the requirements for the uniformity and scalability of the diffusion process are getting higher and higher. At the same time, the furnace pressure of the diffusion equipment Therefore, the realization of pressure balance in the diffusion furnace is a key link in the development of the ...

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Problems solved by technology

[0002] In semiconductor or solar diffusion furnace equipment, the traditional diffusion furnace production process adopts a non-closed tube method. Since this method has no constraints and control on the pressure in the furnace, it cannot achieve the corresponding pressure balance in the furnace. Therefore, traditional equipment is at the technological level. It is difficult to realize the pressure balance standard in the furnace in the diffusion process. With the rapid development of the semiconductor industry, the requirements for the uniformity and scalability of the diffusion process are getting higher and higher. At the same time, the furnace pressure of the diffusion equipment Therefore, the realization of pressure balance in the diffusion furnace is a key link in the development of the semiconductor industry

[0003] In the existing technology, it is impossible to effectively and accurately balance the pressure in the furnace, so that the process level cannot be improved, and when controlling the pressure balance in the furnace, the pressure in the furnace cannot be adjusted due to the uneven distribution of gas in the furnace. accurate detection

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