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Charged particle beam system for scanning a sample

A charged particle beam and charged particle technology, applied in the field of scanning technology, can solve the problem of destroying the structure of the device

Pending Publication Date: 2021-09-10
ASML NETHERLANDS BV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, this approach would destroy the originally designed device structure and would not allow the sample to be used as a device because the blanket-coated gold layer would short out all circuits formed on the sample

Method used

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  • Charged particle beam system for scanning a sample
  • Charged particle beam system for scanning a sample
  • Charged particle beam system for scanning a sample

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Embodiment Construction

[0028]Reference will now be made in detail to the exemplary embodiments, examples of which are illustrated in the accompanying drawings. The following description refers to the accompanying drawings, in which like numerals in different drawings refer to the same or similar elements unless otherwise stated. The implementations set forth in the following description of the exemplary embodiments do not represent all implementations according to the invention. Rather, they are merely examples of apparatus and methods in accordance with aspects of the invention as set forth in the appended claims. For example, although some embodiments are described in the context of utilizing a scanning electron microscope (SEM) to generate wafer images and detect defects, the disclosure is not limited thereto. Other types of microscopes such as transmission electron microscopy (TEM) and scanning tunneling microscopy (STM) can be similarly applied.

[0029] Enhancing the computing power of elect...

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Abstract

A method for scanning a sample by a charged particle beam tool is provided. The method includes providing the sample having a scanning area including a plurality of unit areas, scanning a unit area of the plurality of unit areas, blanking a next unit area of the plurality of unit areas adjacent to the scanned unit area, and performing the scanning and the blanking the plurality of unit areas until all of the unit areas are scanned.

Description

[0001] Cross References to Related Applications [0002] This application claims priority to US Application 62 / 787,121, filed December 31, 2018, and US Application 62 / 943,695, filed December 4, 2019, which are hereby incorporated by reference in their entireties. technical field [0003] Apparatuses and methods according to the present disclosure relate generally to scanning techniques, and more particularly to methods and systems for scanning a sample by a charged particle beam tool such as a scanning electron microscope (SEM). Background technique [0004] During the manufacture of integrated circuits (ICs), unfinished or completed circuit components are inspected to ensure that they are manufactured as designed and free from defects. Inspection systems using optical microscopes or charged particle (eg electron) beam microscopes (eg SEM) may be employed. For inspection of fine structures, electron beams are preferred. Using an electron beam to perform such inspections o...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01J37/28G01N23/2251G01R31/28G01R31/307
CPCH01J37/28G01N23/2251H01J2237/24592H01J2237/043H01J2237/2817G01N2223/102G01N2223/351G01N2223/611G01N2223/646G01N23/06G01N23/203H01J37/045H01J37/1474
Inventor A·里昂斯T·I·瓦洛
Owner ASML NETHERLANDS BV
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