Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Anti-falling structure for oblique photogrammetry unmanned aerial vehicle

A technology of oblique photogrammetry and drones, applied in the field of drones, can solve problems such as damage to drones, economic losses, and damage to the bottom of the fuselage, and achieve the effect of increasing the service life and protecting the fuselage

Inactive Publication Date: 2021-06-08
武汉星智绘空间信息技术有限公司
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] With the development of science and technology, the application of drones is becoming more and more extensive, and drones can be seen in various fields. In photography operations, in order to capture beautiful scenery from various angles, the help of drones is indispensable. , but in some news, it is often seen that the UAV has control problems and falls. Once it falls, it means that the UAV is damaged. The manufacturing cost of the UAV is very high. It will bring huge economic losses. Under the existing technology, in order to prevent the crash of the UAV, it is often added a parachute to the UAV, and the speed reactor is used to control the opening of the parachute, but even so, there will be Certain damage to the bottom of the fuselage will also bring a certain degree of economic loss

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Anti-falling structure for oblique photogrammetry unmanned aerial vehicle
  • Anti-falling structure for oblique photogrammetry unmanned aerial vehicle
  • Anti-falling structure for oblique photogrammetry unmanned aerial vehicle

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0018] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0019] see Figure 1 to Figure 4 , the present invention provides a technical solution:

[0020] An anti-falling structure for an inclined photogrammetry drone, comprising a buffer box 1, a connection hole 2 is opened on the buffer box 1, a connection bolt 3 is inserted in the connection hole 2, and a spring 4 is sleeved on the connection bolt 3, The buffer box 1 is provided with an airbag groove 5, and an airbag 6 is inserted into the airbag groove 5, and th...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to the technical field of unmanned aerial vehicles, and in particular, relates to an anti-falling structure for an oblique photogrammetry unmanned aerial vehicle, wherein the anti-falling structure comprises a buffer box; a connecting hole is formed in the buffer box, a connecting bolt is inserted in the connecting hole, a spring is sleeved on the connecting bolt, an air bag groove is formed in the buffer box, and an air bag is inserted in the air bag groove. According to the technical scheme, the buffer box is in threaded connection with an aircraft body, and when an aircraft falls and touches the ground, rolling wheels are squeezed by the aircraft body and move outwards; meanwhile, an eccentric wheel is jacked upwards, and the air bag on the buffer box can be jacked out of the air bag groove to make contact with the aircraft body, so that the buffering effect can be achieved to a great extent, and the aircraft body is protected; and when the connecting bolt is extruded by the aircraft body, the connecting bolt moves downwards, so that a spring on the bolt is extruded and compressed, and the downward impact force of the aircraft body can be buffered, so that an auxiliary buffering effect is achieved, the buffering device is protected, and the service life is prolonged.

Description

technical field [0001] The invention relates to the technical field of unmanned aerial vehicles, in particular to an anti-fall structure for inclined photogrammetry unmanned aerial vehicles. Background technique [0002] With the development of science and technology, the application of drones is becoming more and more extensive, and drones can be seen in various fields. In photography operations, in order to capture beautiful scenery from various angles, the help of drones is indispensable. , but in some news, it is often seen that the UAV has control problems and falls. Once it falls, it means that the UAV is damaged. The manufacturing cost of the UAV is very high. It will bring huge economic losses. Under the existing technology, in order to prevent the crash of the UAV, it is often added a parachute to the UAV, and the speed reactor is used to control the opening of the parachute, but even so, there will be A certain damage to the bottom of the fuselage will also bring ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): B64D45/06
CPCB64D45/06
Inventor 张超鲁钊王万伟
Owner 武汉星智绘空间信息技术有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products