Extended target wavefront detection method based on edge enhancement

A technology of edge enhancement and extended target, which is applied in the direction of testing optical performance, etc., can solve the problems that the wavefront detection system cannot accurately measure the wavefront aberration and the accuracy of the correlation matrix is ​​low, so as to improve the calculation accuracy and accuracy , to maintain real-time effects

Active Publication Date: 2021-05-28
四川中科朗星光电科技有限公司
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Problems solved by technology

[0004] However, for scenes with low image contrast and clarity, the accuracy of the correlation matrix calculated by directly bringing the sub-aperture original image or the image after filtering and removing noise into the correlation function is low, which makes the wavefront detection system unable to accurately realize the wavefront Measurement of frontal aberrations

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  • Extended target wavefront detection method based on edge enhancement
  • Extended target wavefront detection method based on edge enhancement
  • Extended target wavefront detection method based on edge enhancement

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Embodiment 1

[0034] Step 1, using the Hartmann wavefront sensor to obtain sub-aperture images of the extended target to be measured obtained by imaging each sub-aperture. Specifically, the Hartmann wavefront sensor is placed at a position that can ensure that its microlens array is conjugate to the pupil of the extended target imaging system, and the image acquisition with the photosensitive chip located at the focal plane of the Hartmann wavefront sensor microlens array The device collects images of the extended target to be measured obtained by imaging each sub-aperture of the Hartmann wavefront sensor.

[0035] Step 2, utilize the edge enhancement operator to carry out edge enhancement to each image obtained in step 1, specifically as follows:

[0036] 2.1, first determine the edge enhancement operator to be used in the Laplacian operator, Sobel operator, Prewitt operator, and Roberts operator;

[0037] 2.2, generate the corresponding image enhancement template matrix Mask according to...

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Abstract

The invention relates to an extended target wavefront detection method based on edge enhancement. The method comprises the following steps: S1, acquiring an extended target image to be detected; S2, performing edge enhancement on each to-be-detected extended target image by using an edge enhancement operator; S3, calculating a correlation matrix of each image obtained in the S2 and the template image; S4, finding out the maximum value of each relevancy matrix, and calculating the relative position offset of the to-be-detected extended target image and the template image; S5, multiplying the relative position offset vector by the aberration mode coefficient reconstruction matrix to obtain a wavefront aberration mode coefficient, and completing wavefront measurement. According to the invention, after edge enhancement is carried out on the image obtained by the subaperture of the Hartmann wavefront sensor by using the edge enhancement operator, the accuracy of the correlation matrix calculated by substituting the image into the correlation function can be greatly improved under the condition of low contrast, so the calculation accuracy of the relative displacement between the image obtained by the subaperture and the template image is improved; and finally, the reconstruction precision of the wavefront aberration coefficient is obviously improved.

Description

technical field [0001] The invention relates to the technical field of optical measurement, in particular to an edge enhancement-based extended target wavefront detection method. Background technique [0002] The main function of the extended target wavefront detection method is to detect the wavefront aberration information in the optical path in the optical system that needs to image the extended target. In a system for such aberration wavefront detection, the Hartmann wavefront sensor is generally used to image the target molecular aperture, and then a correlation algorithm is used to calculate the correlation matrix between each subaperture image and the template image, and then through interpolation The algorithm obtains the relative position offset information between each sub-aperture image and the template image, and finally uses the relative position offset information vector and the mode reconstruction matrix to calculate and obtain the wavefront aberration slope i...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01M11/02
CPCG01M11/02Y02A90/10
Inventor 杨博宋伟红
Owner 四川中科朗星光电科技有限公司
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