Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Wafer automatic needle aligning device and method

A wafer, automatic technology, applied in the direction of measuring devices, electronic circuit testing, instruments, etc., can solve the problems of lower needle alignment efficiency, complicated operation, poor stability, etc.

Pending Publication Date: 2021-05-14
CHANGSHUN GUANGHUA MICRO ELECTRONICS EQUIP ENG CENT
View PDF1 Cites 7 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The above-mentioned needle alignment method has the disadvantages of complicated operation and poor stability
[0004] In the invention patent number CN105486995B "Automatic Probe Station Image Positioning Device and Visual Alignment Method", a needle alignment device and method for precise needle alignment by means of calibration blocks are proposed, which can achieve higher precision needle alignment , but it involves too many formulas and too many calculations. In the calculation process, it is very easy to produce errors due to the manufacturing accuracy or installation accuracy of the calibration block, which will affect the needle alignment accuracy and reduce the needle alignment efficiency.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Wafer automatic needle aligning device and method
  • Wafer automatic needle aligning device and method
  • Wafer automatic needle aligning device and method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0039] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with the accompanying drawings and specific embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, but not to limit the present invention.

[0040] Such as figure 1 As shown, the wafer automatic needle alignment device provided by the present invention includes an image acquisition component 1 composed of a camera with a crosshair mark on the lens surface, a motion component 2 for fixed value movement through a grating ruler, a data processing component, and a The wafer tray 3 of the wafer to be aligned, and the probe card 4 for aligning the wafer to be aligned; the image acquisition component 1 collects the images of the wafer tray 3, the probe card 4, and the wafer to be aligned, and The collected image is transmitted to...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides an automatic wafer alignment device and method. The automatic wafer alignment device comprises an image acquisition assembly, a movement assembly, a data processing assembly, a wafer tray used for carrying wafer to be aligned, and a probe card for alignment with the wafer to be aligned, wherein the image acquisition assembly consists of a camera of which the surface of a lens is provided with a cross wire mark, the movement assembly performs fixed-value movement through a grating ruler, the image acquisition assembly is used for acquiring images of the wafer tray, the probe card and the wafer to be subjected to probe alignment and transmitting the images to the data processing assembly; the data processing assembly is used for processing the received image data and calculating needle aligning parameters according to the data; the wafer tray is fixedly connected with the movement assembly, and the wafer tray is driven by the movement assembly to move. Wafer needle alignment is carried out through image recognition and grating ruler positioning, and needle alignment in the X direction, the Y direction and the Z direction can be completed at the same time; a calibration block is not used, so installation difficulty and needle alignment operation steps are reduced; the needle alignment method is simple, data processing is more accurate, and alignment precision and efficiency are improved.

Description

technical field [0001] The invention relates to the field of wafer processing, in particular to an automatic wafer alignment device and method. Background technique [0002] Wafer probe station is the equipment that supports the testing machine to test the performance and quality of each chip on the wafer in the front process of semiconductor chip manufacturing. It is an essential link to ensure the quality of chip manufacturing and reduce manufacturing costs and losses. After the wafer manufacturing is completed, it is necessary to enter the wafer testing stage. The wafer testing uses a testing machine to test each die on the chip through the combination of the probe station and the probe. The pad makes direct contact so that the testing machine can directly input or output signals to the chip, and its test parameters include the DC parameters and AC parameters of the chip. [0003] Existing wafer probe stations mostly use test alignment. The probe card is preliminarily ad...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): G01R31/28G01R1/067H01L21/68
CPCG01R1/06794G01R31/2831H01L21/681
Inventor 田学光高跃红郑福志孙德举王蕾王骕
Owner CHANGSHUN GUANGHUA MICRO ELECTRONICS EQUIP ENG CENT
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products