Target material cleaning method

A technology of target material and cleaning table, applied in the direction of cleaning methods and utensils, chemical instruments and methods, etc., can solve the problems of low cleaning efficiency, high risk, human body hazards, etc., to reduce labor costs, reduce health hazards, and clean The effect of shortening time

Inactive Publication Date: 2021-03-09
东莞市欧莱溅射靶材有限公司 +1
View PDF7 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] At present, target cleaning is limited to chemical cleaning, which is harmful to the human body and causes great environmental pollution.
The chemicals used for cleaning are flammable, which can easily cause production safety accidents and are highly dangerous
At present, the target is generally cleaned manually with chemical cleaning products, the cleaning and wiping force is uneven, the cleaning coverage is not comprehensive, and the cleaning pass rate is low.
Because the material of the target is easy to oxidize, when the cleaning time is too long, the target will be slightly oxidized during the cleaning process. At the same time, the target is also prone to slight oxidation during the production process. After cleaning, the target needs to be re-grinded before manual cleaning. Manual cleaning is not comprehensive and the cleaning efficiency is low.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Target material cleaning method
  • Target material cleaning method
  • Target material cleaning method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0026] The following are only preferred embodiments of the present invention, and therefore do not limit the protection scope of the present invention.

[0027] A method for cleaning a target, such as Figure 1 to Figure 2 As shown, the method for cleaning the target 14 of the present invention uses a target cleaning device to spray dry ice on the surface of the target 14 to be cleaned. The cleaning of the target 14 is characterized in that the material is easy to oxidize, the cleaning area is large, there are many surfaces to be cleaned, and there are various cleaning surfaces at different angles. Existing cleaning of the target 14 is done manually using chemicals such as alcohol or acetone. The target material 14 is cleaned manually with chemicals, which are harmful to the human body. Due to the large cleaning area of ​​the target material 14 and the slow manual cleaning speed, it takes a long time to complete the cleaning of the entire target material 14, resulting in sli...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a target material cleaning method. The cleaning method is characterized in that a dry ice spray gun group and a cleaning table move relatively, so that a dry ice spray gun completely covers a target material for cleaning. According to the target material cleaning method, dry ice is used for cleaning the target material through cleaning equipment, the target material is completely covered for cleaning, the cleaning time is shortened, and target material oxide is effectively removed.

Description

technical field [0001] The invention relates to the technical field of target cleaning, in particular to a target cleaning method. Background technique [0002] In the process of sputtering coating, the cleanliness of the target is very important to the coating quality, product yield and production cost formed by sputtering. Due to the low cleanliness of the target surface, black oxides ranging in size from a few microns to several millimeters accumulate on the sputtering surface of the target, which is generally called nodulation. Nodules are insulating, and the amount of nodules increases, which often causes abnormal discharges during the sputtering process, causing particles to appear in the coating, affecting the quality of the coating, and reducing the yield of products. Therefore, in the target production process, in order to ensure that the target has sufficient cleanliness, the target needs to be fully cleaned before packaging. [0003] At present, target cleaning ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): B08B7/00B08B13/00
CPCB08B7/00B08B13/00
Inventor 文宏福郭文明
Owner 东莞市欧莱溅射靶材有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap