Semiconductor device and manufacturing method thereof
A manufacturing method and semiconductor technology, applied in the direction of semiconductor devices, final product manufacturing, sustainable manufacturing/processing, etc., can solve problems such as cost increase
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[0043] In order to make the objects, advantages and features of the present invention clearer, the following are combined with the appendix Figure 2a ~ Figure 4 The semiconductor device and its manufacturing method proposed by the present invention will be further described in detail. It should be noted that, the accompanying drawings are all in a very simplified form and in inaccurate scales, and are only used to facilitate and clearly assist the purpose of explaining the embodiments of the present invention.
[0044] An embodiment of the present invention provides a semiconductor device, the semiconductor device includes a substrate, an ion-doped region, an electric deep trench isolation ring, a top electrode and a bottom electrode, and the ion-doped region is formed on the substrate in; the deep trench isolation ring is formed in the substrate and surrounds the outer side of the ion-doped region, and is insulated from the ion-doped region in the substrate; the top electrod...
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