Multi-channel switching Langmuir probe measurement system

Abstract

The invention discloses a multi-channel switching Langmuir probe measurement system which comprises a plasma, a Langmuir probe, a multi-channel switching system, a single-probe scanning measurement circuit, a data acquisition and processing system and a master control system interaction interface. A plurality of Langmuir probes placed in the plasma are connected with a single-probe scanning measurement circuit through a multi-channel switching system, and data processing is carried out by using a current-voltage curve acquired and measured by the data acquisition and processing system so as toobtain corresponding plasma parameter data measured by each probe. According to the invention, the single-probe scanning measurement circuit is used; by switching the Langmuir probes of multiple channels, measurement of plasma parameters at different probe positions is realized, the cost of plasma parameter measurement is reduced, and human-computer interaction operation is simple and convenient;and the system is suitable for monitoring and measuring steady-state plasma discharge parameters at a certain time scale.

Description

technical field [0001] The invention relates to the technical field of plasma diagnosis, in particular to a multi-channel switching Langmuir probe measurement system. Background technique [0002] At present, there are many kinds of diagnostic techniques for plasma. Langmuir probe is the most commonly used diagnostic technique for plasma parameter measurement, because of its simple structure and convenient signal processing. Currently, almost all plasma discharge devices are equipped with such probe diagnostic system. By inserting a small or specially shaped probe into the plasma, which is insulated from the plasma wall, and scanning the probe with a certain range of voltage, the required current-voltage (I-V) has been obtained. Change curve, and then use the corresponding data analysis theory to obtain plasma parameters, such as electron temperature, electron density, levitation potential, etc. [0003] Usually, on a plasma generating device, in order to obtain plasma par...

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Problems solved by technology

[0003] Usually, on a plasma generating device, in order to obtain plasma parameters at different positions, it is necessary to install probes at corresponding positions to measure the plasma, and the probes at each position need to be independently equipped with a scanning power supply, which cannot be All probes are connected in parallel on one scanning power supply, so when the number of probes is very large, it will increase the cost of the system

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