Double buffer photoresist spraying system

Abstract

A double-buffer photoresist liquid spraying system, characterized in that it includes: a first liquid storage tank, a first filter; a first buffer; the first filter is arranged between the first liquid storage tank and the between the first buffers; the first buffer is connected with a first return pipe; the first return pipe is equipped with a first return pump; a second liquid storage tank; a second filter; Buffer; the second filter is arranged between the second liquid storage tank and the second buffer; the second buffer is connected with a second return pipe; the second return pipe is installed There is a second back pump; it also includes one of the following two structures: the first structure includes the selection mechanism and the total photoresist liquid pump; the second structure includes the selection mechanism, the first photoresist liquid pump and the second photoresist liquid pump. Two photoresist liquid pumps. The double-buffer photoresist liquid spraying system can better save photoresist liquid and ensure non-stop supply of photoresist liquid.

Description

technical field [0001] The invention relates to the field of semiconductor manufacturing, in particular to a double-buffer photoresist liquid spraying system. Background technique [0002] Photoresist coating (Coating) plays a very important role in the field of semiconductor manufacturing. For example, in the etching process, the photoresist layer is used as a mask for the etched film to keep the desired pattern from being removed by the etching reaction. Another example is in the ion implantation (ion implantation) process, the photoresist layer also has the function of a mask, so that doping is only doped into a predetermined area. [0003] The photoresist liquid spraying system mainly includes structures such as a first liquid storage tank, a first buffer, a first photoresist liquid pump, a filter, a control valve, and a nozzle. The photoresist liquid supplied from the first liquid storage tank first enters the first buffer, and then the photoresist liquid in the first...

AI Technical Summary

Problems solved by technology

[0007] However, during the pre-wetting process of the filter, air bubbles will be generated due to the influence of speed, pressure or temperature

If the coating operation is carried out directly, the coating effect will be affected

If the exhaust operation is performed after pre-wetting, it will take more time and increase the cost of photoresist fluid, making filter replacement a time-consuming and cost-intensive procedure

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