Temperature control device and etching equipment
A technology of temperature control device and etching chamber, which is applied in semiconductor/solid-state device manufacturing, electrical components, circuits, etc. It can solve the problems of over-etching or under-etching of etched substrates, large deviation of CDBias, and lower product yield, etc., to achieve Avoid etching process defects, ensure uniformity, and improve the effect of yield
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[0031] The application will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain related inventions, rather than to limit the invention. It should also be noted that, for ease of description, only parts related to the invention are shown in the drawings.
[0032] It should be noted that, in the case of no conflict, the embodiments in the present application and the features in the embodiments can be combined with each other. The present application will be described in detail below with reference to the accompanying drawings and embodiments.
[0033] understandable, such as figure 1 As shown, in the etching process, using such as figure 1 The etching chamber shown is carried out, and the top of the etching chamber 1 is provided with a top plate 11 and a cover plate 12, and the top plate is usually a glass plate. During the etching pro...
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