A kind of refractive index matching depolarizing film system

A technology of refractive index matching and low refractive index film, applied in the field of optical films, can solve the problems of inability to realize industrialization, high technical difficulty, inability to take into account the depolarization capability and passband width, etc., achieve good spectral characteristics, and optimize the process route. , the effect of small polarization separation

Active Publication Date: 2021-11-12
SHENYANG ACAD OF INSTR SCI
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Problems solved by technology

Existing depolarization film systems cannot balance depolarization capability and passband width
Chinese patent (CN105242340B) discloses a depolarizing film system composed of three refractive index materials, which has good spectral performance, and the intermediate refractive index material is realized by the method of material ratio. The process requires the use of co-evaporation technology, which is technically difficult. Large, unable to achieve industrialization

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  • A kind of refractive index matching depolarizing film system
  • A kind of refractive index matching depolarizing film system
  • A kind of refractive index matching depolarizing film system

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[0026] Such as Figure 4 As shown, the depolarizing film system with matching refractive index is the depolarizing film system S|(αHβLγMβLαH)^ n Based on |A, according to the principle of refractive index matching, the basic film system formula for the design of the two materials is realized by using the matching film stack (aHbLaH) to replace the original γM film layer: S|(αHβLaHbLaHβLαH)^ n |A

[0027] Among them: S is glass substrate; A is air; H is high refractive index film material; L is low refractive index film material; a and b are refractive index matching coefficients; α and β represent matching coefficients of different materials respectively; n is the number of cycles; the optical thickness of H and L is λ 0 / 4.

[0028] The high refractive index film layer material described in the present invention is TiO 2 、 Ta 2 o 5 , Nb 2 o 5 , HfO 2 Any one of them, the material of the low refractive index film layer is SiO 2 .

[0029] Example:

[0030] Accordin...

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Abstract

The present invention relates to the field of optical films, in particular to a depolarizing film system with matching refractive index, which is based on the depolarizing film system S|(αHβLγMβLαH)^ of three materials n Based on |A, according to the principle of refractive index matching, the basic film system formula for the design of the two materials is realized by using the matching film stack (aHbLaH) to replace the original γM film layer: S|(αHβLaHbLaHβLαH)^ n |A, where: S is glass substrate; A is air; H is high refractive index material; L is low refractive index material; a, b are refractive index matching coefficients; α, β represent matching coefficients of different materials; n is Number of cycles; H, L optical thickness is λ 0 / 4. The film system greatly reduces the difficulty of the production process on the basis of meeting the depolarization requirements in the oblique incidence application field.

Description

technical field [0001] The invention relates to the field of optical films, in particular to a depolarization film system with matching refractive index. Background technique [0002] The depolarization film system is mainly used in the interference cut-off filter used at an angle, and its function is to eliminate the polarization separation caused by the oblique incidence of the conventional film system, and ensure that the cut-off steepness and the width of the transmission area meet the application requirements. Existing depolarization film systems cannot balance depolarization capability and passband width. Chinese patent (CN105242340B) discloses a depolarizing film system composed of three refractive index materials, which has good spectral performance, and the intermediate refractive index material is realized by the method of material ratio. The process requires the use of co-evaporation technology, which is technically difficult. Larger, unable to realize industrial...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B5/30G02B5/28
CPCG02B5/285G02B5/30
Inventor 任少鹏赵帅峰高鹏金秀班超王忠连杨文华胡雯雯
Owner SHENYANG ACAD OF INSTR SCI
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