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A method for making a photomask and a display panel for making an active switch

A switch, active technology, applied in the direction of the photoplate process of the original, optics, pattern surface, etc. for photomechanical processing

Active Publication Date: 2020-04-14
HKC CORP LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] The technical problem to be solved by the present invention is to provide a method for making a photomask and a display panel for an active switch that can alleviate the problem of out-of-focus during exposure at the channel

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  • A method for making a photomask and a display panel for making an active switch
  • A method for making a photomask and a display panel for making an active switch

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Embodiment Construction

[0037] It should be understood that the terminology and specific structural and functional details disclosed herein are representative only for describing specific embodiments, but the application can be embodied in many alternative forms and should not be construed as merely Be limited by the examples set forth herein.

[0038] In the description of the present application, the terms "first" and "second" are used for descriptive purposes only, and cannot be understood as indicating relative importance, or implicitly indicating the quantity of indicated technical features. Therefore, unless otherwise specified, the features defined as "first" and "second" may explicitly or implicitly include one or more of these features; "plurality" means two or more. The term "comprising" and any variations thereof mean non-exclusive inclusion, possible presence or addition of one or more other features, integers, steps, operations, units, components and / or combinations thereof.

[0039] Al...

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Abstract

The invention discloses a method for making a photomask and a display panel for making an active switch. The photomask includes a light-shielding area, corresponding to the metal layer of the active switch, which is configured to be opaque; a semi-light-transmitting area, The channel area corresponding to the active switch is configured to be partially transparent; the transparent area is configured to be completely transparent except for the light-shielding area and the semi-transparent area; The area, located in the semi-transparent area, is configured to be completely transparent; the semi-transparent area includes a semi-circular area and a linear area, and the hollow area is located in the semi-circular area of ​​the semi-transparent area. within the area. In the present application, a hollow area is provided on the semi-transparent area, and the hollow area can increase the light transmission amount of the semi-transparent area, thereby reducing the out-of-focus phenomenon during exposure and improving the process yield.

Description

technical field [0001] The invention relates to the field of display technology, in particular to a method for making a photomask for making an active switch and a display panel. Background technique [0002] The four-process process is commonly used in the production of display panels. Its function is to combine the amorphous silicon layer and the data line or the source-drain metal layer into a photomask. Compared with the traditional five-process process, it reduces one photolithography process. Can improve production efficiency. Each mask process in the four-process process will go through the steps of exposure, development, etching, and photoresist stripping; in the actual production process, because the light has a certain scattering effect, it will affect the exposure quality of the active switch. [0003] The arc-shaped channel region of the active switch is out of focus during exposure. Contents of the invention [0004] The technical problem to be solved by the...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F1/54G03F1/00
CPCG03F1/00G03F1/54G03F1/50G03F1/38H01L27/1288H01L29/41733
Inventor 吴川
Owner HKC CORP LTD
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