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Nanoimprint template and manufacturing method thereof

A manufacturing method and nanoimprinting technology, which is applied in the field of semiconductors, can solve problems such as poor peeling, and achieve the effect of improving poor peeling

Pending Publication Date: 2018-11-23
BOE TECH GRP CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] The present invention provides a nano-imprint template and a manufacturing method thereof, so as to improve the problem of poor peeling caused by the high step difference in the stitching overlapping area of ​​the nano-imprint template in the prior art

Method used

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  • Nanoimprint template and manufacturing method thereof
  • Nanoimprint template and manufacturing method thereof

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Embodiment Construction

[0034] In order to make the purpose, technical solutions and advantages of the embodiments of the present disclosure clearer, the technical solutions of the embodiments of the present disclosure will be clearly and completely described below in conjunction with the drawings of the embodiments of the present disclosure. Apparently, the described embodiments are some of the embodiments of the present disclosure, not all of them. Based on the described embodiments of the present disclosure, all other embodiments obtained by persons of ordinary skill in the art without creative effort fall within the protection scope of the present disclosure.

[0035] Unless otherwise defined, the technical terms or scientific terms used in the present disclosure shall have the usual meanings understood by those skilled in the art to which the present disclosure belongs. "First", "second" and similar words used in the present disclosure do not indicate any order, quantity or importance, but are o...

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Abstract

The invention discloses a nanoimprint template and a manufacturing method thereof, for solving the poor peeling problem due to the relatively high segment gap of the nanoimprint template in a joint overlap area in the prior art. The manufacturing method of the nanoimprint template comprises the steps of: forming a groove in a pre-set area on one surface of a substrate film used for coating an imprint adhesive, wherein the pre-set area is an area that the imprint adhesives in adjacent two coating surfaces are in joint overlap; coating the imprint adhesive in a first coating area and the groove,wherein the thickness of the imprint adhesive positioned in the groove is less than the depth of the groove; performing pattern imprinting on the imprint adhesive in the first coating area; coating the imprint adhesive in a second coating area and the groove, wherein the second coating area and the first coating area are adjacent two coating areas; and performing pattern imprinting on the imprintadhesives in the second coating area and the groove.

Description

technical field [0001] The invention relates to the technical field of semiconductors, in particular to a nanoimprint template and a manufacturing method thereof. Background technique [0002] The development of the semiconductor manufacturing industry relies on the improvement of low-cost micro-pattern structure transfer technology, but with the continuous reduction of the feature size of the pattern, the traditional photolithography technology based on the wavelength of light is gradually unable to do what it wants. Nanoimprinting (NIL) is a method that directly uses mechanical contact extrusion to redistribute the imprinted material between the template and the substrate. Compared with traditional lithography technology, it has the characteristics of high resolution; compared with high-resolution focused ion beam lithography, electron beam lithography, X-ray lithography and other technologies, it has high yield, low cost, It can be mass-produced and other characteristics...

Claims

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Application Information

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IPC IPC(8): G03F7/00
CPCG03F7/0002
Inventor 刘震谷新郭康谭伟李超
Owner BOE TECH GRP CO LTD
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