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Method of identifying airborne molecular contamination source

A gaseous molecule and air flow technology, which is used in the field of identifying the source of gaseous molecule pollution and can solve problems such as adverse effects on IC devices

Pending Publication Date: 2018-09-18
TAIWAN SEMICON MFG CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This may adversely affect semiconductor manufacturing processes, workshops, and related IC devices

Method used

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  • Method of identifying airborne molecular contamination source
  • Method of identifying airborne molecular contamination source
  • Method of identifying airborne molecular contamination source

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Embodiment Construction

[0036] The following disclosure provides many different embodiments, or examples, for implementing different elements of the invention. Specific examples of components and arrangements are described below to simplify the present disclosure. These are of course merely examples and are not intended to be limiting. For example, the formation of a first component on or over a second component in the following description may include embodiments in which the first and second components are formed in direct contact, and may also include embodiments in which additional components may be formed on the first component. and the second part, such that the first and second parts are not in direct contact. Furthermore, the present invention may repeatedly refer to numerals and / or letters in various examples. This repetition is for brevity and clarity and does not in itself dictate a relationship between the various embodiments and / or structures described.

[0037] now refer to figure 1...

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Abstract

The present disclosure provides a method of identifying an airborne molecular contamination (AMC) leaking source in a fab. The method includes distributing a sensor in the fab, executing a forward computational fluid dynamics (CFD) simulation of an air flow in the fab, setting an inversed modeling of the forward CFD simulation of the air flow in the fab, building up a database of a spatial response probability distribution matrix of the sensor using an AMC measurement data in the fab, and identifying the AMC leaking source using the database of the spatial response probability distribution matrix of the sensor.

Description

[0001] This application claims to be a divisional application of the invention patent application with the application number 201310028005.0 entitled "Method for Identifying Gas Molecular Pollution Sources" filed on January 24, 2013. technical field [0002] The present invention relates generally to the field of semiconductor technology, and more particularly to methods and apparatus for identifying sources of gaseous molecular contamination (AMC) leaks. Background technique [0003] The semiconductor integrated circuit (IC) industry has experienced exponential growth. Technological advances in IC materials and design have produced multiple generations of ICs, where each generation has smaller and more complex circuits than the previous generation. In the course of IC development, functional density (ie, the number of interconnected devices per chip area) has increased substantially while geometry size (ie, the smallest component (or line) that can be made using a fabricati...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N33/00
CPCG01N33/0004H01L21/02H01L22/00G06F15/00
Inventor 庄子寿黄正吉周政隆杨棋铭林进祥
Owner TAIWAN SEMICON MFG CO LTD
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