Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Mask as well as manufacturing method and evaporation method thereof

A mask and evaporation technology, applied in vacuum evaporation coating, sputtering coating, ion implantation coating and other directions, can solve the problem of metal mask wrinkles and other problems, to avoid wrinkles accumulation, reduce friction coefficient, avoid the effect of folds

Active Publication Date: 2018-08-03
BOE TECH GRP CO LTD
View PDF5 Cites 6 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] The purpose of the technical solution of the present invention is to provide a mask, its manufacturing method, and evaporation method, which are used to solve the problem that the metal mask is prone to wrinkles

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Mask as well as manufacturing method and evaporation method thereof
  • Mask as well as manufacturing method and evaporation method thereof
  • Mask as well as manufacturing method and evaporation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0048] In order to make the technical problems, technical solutions and advantages to be solved by the present invention clearer, the following will describe in detail with reference to the drawings and specific embodiments.

[0049]In order to solve the problem that the metal mask is prone to wrinkles, an embodiment of the present invention provides a mask, by providing a groove at the edge of the mask body, and filling the groove with a material that cannot be absorbed by a magnet. Magnetic isolation layer, when the mask plate is applied to the substrate in the evaporation equipment, the distance between the mask plate body at the edge and the magnet element used to generate the magnetic field is increased to reduce the distance at the edge Magnetic adsorption, so that the folds in the opening area can smoothly expand to the edge, avoiding the accumulation of folds, so as to avoid the problem of mask folds.

[0050] combine Figure 4 and Figure 5 As shown, the mask plate ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
Login to View More

Abstract

The embodiment of the invention provides a mask as well as a manufacturing method and an evaporation method thereof. The mask comprises a mask body and a magnetic isolation layer, wherein the mask body is made of a metal material capable of being adsorbed by magnet; a first surface of the mask body comprises a pore formation area provided with multiple pores, and a first groove is formed between the edge of the mask body and the pore formation area in the first surface; the magnetic isolation layer is made of a material that cannot be adsorbed by the magnet; the magnetic isolation layer is arranged between the edge of the mask body and the pore formation area, and at least one part of the magnetic isolation layer fills the first groove. According to the mask disclosed by the invention, thegroove is formed in the edge of the mask body, and the groove is filled with the magnetic isolation layer. Compared with the prior art, the mask disclosed by the invention has the advantages that magnetic adsorption force on the edge can be reduced, the fold in the middle pore area can be smoothly spread to the edge, and fold accumulation can be avoided. Therefore, the aim of avoiding the fold ofthe mask is achieved.

Description

technical field [0001] The invention relates to the field of display technology, in particular to a mask plate, a manufacturing method thereof, and an evaporation method. Background technique [0002] In the organic light-emitting diode (Organic Light-Emitting Diode, OLED) manufacturing process, a high-precision metal mask (Fine Metal Mask, FMM) is usually used as an evaporation mask to evaporate the luminescent material on the corresponding array substrate. The open area forms an OLED device. [0003] Such as figure 1 As shown, when the metal mask 1 is used to vapor-deposit material on the substrate 2 to be evaporated, the metal mask 1 is attached to the substrate 2 to be evaporated, and the other side of the substrate 2 to be evaporated is used to The adsorption force of the magnet element 3 to the metal mask 1 makes the metal mask 1 and the substrate 2 to be evaporated closely connected, and the evaporated material passes through the corresponding opening 11 on the meta...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/04C23C14/12C23C14/24
CPCC23C14/042C23C14/12C23C14/24
Inventor 朱海彬金鑫
Owner BOE TECH GRP CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com