Preparation method of ultra-abrasion-resistant high-transmittance zirconia thin film

A high transmittance, zirconia technology, applied in ion implantation plating, metal material coating process, coating, etc., can solve the problems of poor transmittance, low wear resistance of zirconia film, etc., to achieve durability Good abrasion resistance, meet the requirements of transmittance, and good film-base binding force

Inactive Publication Date: 2018-06-12
(CNBM) BENGBU DESIGN & RES INST FOR GLASS IND CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] However, the current preparation process of zirconia films has defects. The prepared zirconia films have low wear resistance and poor transmittance.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0022] The invention provides a method for preparing a super wear-resistant high transmittance zirconia film, comprising the following steps:

[0023] S1. Choose 1.1mm ordinary white glass as the substrate, clean the substrate, remove the stain on the surface of the substrate and dry it;

[0024] S2. Put the cleaned substrate into the magnetron sputtering coating equipment, and evacuate the sputtering chamber, when the vacuum degree is 2.5*10 -3 At Pa, bake the sputtering chamber at a temperature of 60°C for 20 minutes to discharge the impurity molecules in the sputtering chamber;

[0025] S3. After the baking is finished, use zirconium as the target material, use radio frequency power supply, when the vacuum degree is 1*10 -4 Pre-sputtering is carried out at Pa, the pre-sputtering RF power supply is 250W, the target is first glowed with 200 sccm argon gas, and then pre-sputtered with 30 sccm argon gas for 1h;

[0026] After pre-sputtering, the vacuum degree is 9.4*10 -4 At...

Embodiment 2

[0028] The invention provides a method for preparing a super wear-resistant high transmittance zirconia film, comprising the following steps:

[0029] S1. Choose 1.1mm ordinary white glass as the substrate, clean the substrate, remove the stain on the surface of the substrate and dry it;

[0030] S2. Put the cleaned substrate into the magnetron sputtering coating equipment, and evacuate the sputtering chamber, when the vacuum degree is 2.5*10 -3 Pa, bake the sputtering chamber at a temperature of 65°C for 30 minutes to discharge the impurity molecules in the sputtering chamber;

[0031] S3. After the baking is finished, use zirconium as the target material, use radio frequency power supply, when the vacuum degree is 1*10 -4 Pre-sputtering is carried out at Pa, the pre-sputtering RF power supply is 250W, the target is first glowed with 200 sccm argon gas, and then pre-sputtered with 30 sccm argon gas for 1h;

[0032] After pre-sputtering, the vacuum degree is 7.9*10 -4 At Pa...

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Abstract

The invention discloses a preparation method of an ultra-abrasion-resistant high-transmittance zirconia thin film. The preparation method comprises the following steps that 1, a substrate is cleaned,stains on the surface of the substrate are removed, and blow-drying is conducted; 2, the cleaned substrate is placed into magnetron sputtering film coating equipment, when the vacuum degree of a sputtering cavity meets requirements, the sputtering cavity is baked, and impurity molecules in the sputtering cavity are discharged; 3, after baking is completed, the zirconia thin film is deposited at the substrate by using zirconium as a target material, adopting a radio-frequency power supply and using argon and oxygen as sputtering gas through magnetron sputtering. Under the condition that the oxygen is excessive, it is ensured that zirconium atoms can fully react with reaction gas obtain zirconia by adopting high-power radio-frequency sputtering; through high-power sputtering, it can be ensured that primary energy of the zirconium atoms is high, the zirconia thin film can be more compact and good in abrasion resistance when being deposited at the substrate, and it can be ensured that thebinding force between the film and the substrate is better; and the technological process can be controlled accurately, it is ensured that the thickness of the zirconia thin film is controllable, andrequirements for the transmittance are met.

Description

technical field [0001] The invention relates to the technical field of glass film production, in particular to a preparation method of a super wear-resistant high transmittance zirconia film. Background technique [0002] Due to its excellent optical and mechanical properties, glass has become a kind of construction and decoration material widely used in our daily life. However, during long-term use, the wear resistance of glass will be greatly tested. We use magnetron sputtering technology to coat a layer of high-density film on the surface of the glass, which will greatly improve the wear resistance of the glass and improve the quality of the glass. [0003] Zirconia is the main oxide of zirconium, chemically inactive, insoluble in water, hydrochloric acid and dilute sulfuric acid, and has high melting point, high resistivity and low thermal expansion coefficient, high linear expansion coefficient, and small deformation at high temperature , close to the metal substrate. ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/08C23C14/35
CPCC23C14/083C23C14/0036C23C14/35
Inventor 彭塞奥杨扬金克武王天齐甘治平
Owner (CNBM) BENGBU DESIGN & RES INST FOR GLASS IND CO LTD
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