Mask plate and fabrication method thereof
A manufacturing method and a technology of a mask plate, which are applied in the manufacture of semiconductor/solid-state devices, ion implantation plating, coating, etc., can solve the problem of high-precision fine mask plate evaporation surface engraving and the influence of high-precision fine mask plate tensioning Performance and service life and other issues, to achieve better tensile performance, improve the PPI of evaporation, and improve the service life
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[0034] In order to facilitate the understanding of the present invention, the present invention will be described more fully below with reference to the associated drawings. Preferred embodiments of the invention are shown in the accompanying drawings. However, the present invention can be embodied in many different forms and is not limited to the embodiments described herein. On the contrary, the purpose of providing these embodiments is to make the disclosure of the present invention more thorough and comprehensive.
[0035] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the technical field of the invention. The terms used herein are for the purpose of describing specific embodiments only, and are not intended to limit the present invention. As used herein, the term "and / or" includes any and all combinations of one or more of the associated listed items.
[0036] For example...
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