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A kind of preparation method of curved surface hydrophobic microstructure

A technology of microstructure and curved surface is applied in the field of preparation of curved surface hydrophobic microstructure, which can solve the problems of high cost, lack of scale, low-cost preparation capability, etc., and achieves the effect of simple process, low material cost, and improved preparation method.

Active Publication Date: 2022-07-12
NINGXIA SOFTWARE ENG INST CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Since the silicon substrate is used as the mask to realize the patterning of the mask, the cost is high, and complex graphics cannot be realized on the curved surface
[0006] The above cases are relatively complicated, and do not have large-scale and low-cost preparation capabilities

Method used

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  • A kind of preparation method of curved surface hydrophobic microstructure
  • A kind of preparation method of curved surface hydrophobic microstructure
  • A kind of preparation method of curved surface hydrophobic microstructure

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0038] The first step 101: Adhere the peelable water mark paper on the quartz glass, use a 4-12 inch semiconductor quartz glass sheet 201, and use resin to bond the peelable water mark paper 202. The size of the water mark paper is the same as that of the quartz glass sheet. same size.

[0039] The second step 102: Coat the photoresist 203 on the water mark paper and cure it. Use a photoresist spin coater to coat the photoresist to ensure a thickness of 30-80 microns. The thermal curing time is determined by the specific material and thickness. In this example, a positive photoresist with a thickness of 30 microns is used, and the curing time is about 15 minutes.

[0040] The third step 103: use a plane exposure machine to complete the exposure of the microstructure pattern. The microstructure pattern is an array pattern formed by repeated arrangement of a single pattern, and the pattern is one of square, circle and regular hexagon. In this example, a square pattern is used. ...

Embodiment 2

[0048] The first step 101: Adhere the peelable water mark paper 202 on the quartz glass, use a 4-12 inch semiconductor quartz glass sheet 201, and use resin to bond the peelable water mark paper. The size of the water mark paper is the same as that of the quartz glass sheet. same size.

[0049] The second step 102: Coat the photoresist 203 on the water mark paper and cure it. Use a photoresist spin coater to coat the photoresist to ensure a thickness of 30-80 microns. The thermal curing time is determined by the specific material and thickness. In this example, a positive photoresist with a thickness of 40 microns is used, and the curing time is about 25 minutes.

[0050] The third step 103: use a plane exposure machine to complete the exposure of the microstructure pattern. The microstructure pattern is an array pattern formed by repeated arrangement of a single pattern, and the pattern is one of square, circle and regular hexagon. In this example, a square pattern is used. ...

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Abstract

The invention provides a preparation method of a curved surface hydrophobic microstructure, comprising the following steps: adhering a peelable water mark paper on quartz glass; coating a certain thickness of photoresist on the water mark paper and curing; using ultraviolet photolithography The photoresist is developed; the ink synthesized from natural resin and inorganic pigment is added to the channel of the photoresist film layer after the development; the prepared graphic plate is put into an organic solvent to dissolve the photoresist Glue; use activator to peel off the water mark paper and quartz glass; complete the adhesion of the ink pattern by water transfer, and post-treatment to cure the ink, complete the generation of the surface microstructure of the curved material, and realize the hydrophobic function. The invention provides a preparation method of a flexible microstructure, so that the curved surface can also complete the generation of the microstructure, the method is simple, and the scope of application is wide.

Description

[0001] Field of Invention [0002] The invention relates to a preparation method of a microstructure, in particular to a preparation method of a curved surface hydrophobic microstructure. Background technique [0003] Studies have shown that the preparation of micro-nano array structures on the surface of the material can increase the contact angle of the liquid on the surface. When the contact angle is greater than 150 degrees, a superhydrophobic effect can be formed. This technology is very useful in surface treatment. At present, there are methods such as spraying, grinding, and electroplating. For planar materials, the above methods are relatively easy, but the prepared structures are mostly disordered structures. It can use semiconductor photolithography etching process to complete more regular structure preparation. But for curved materials, especially closed curved materials, the preparation of regular microstructures is very difficult. Especially when the size of th...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B81C1/00G03F7/00G03F7/42
Inventor 郑皓天赵娟王俊兵朱凌志马惠宁周舒瑶徐翊桄李征宇王博张静王燕玲杨洋贺伟孙学书张建和李新杰李炜徐良吴婧
Owner NINGXIA SOFTWARE ENG INST CO LTD
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